Re-assembly behaviors of polystyrene-b-poly(acrylic acid) micelles

Polymer

Volumn 50, Issue 25, 2009, Pages 6166-6171

  Zhang, Yang ^a   Xiao, Xing ^a   Zhou, Jian jun ^a   Wang, Lei ^a   Li, Zhi bo ^a   Li, Lin ^a   Shi, Lin qi ^b   Chan, Chi Ming ^c  

^a INSTITUTE OF CHEMISTRY   (China)

^b BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^c HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

Author keywords

Block copolymers; Micelles; Re assembly

Indexed keywords

ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; CARBOXYLIC ACIDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; HYDROGEN BONDS; LIGHT SCATTERING; LIGHT TRANSMISSION; NANORINGS; NANOSTRUCTURED MATERIALS; ORGANIC SOLVENTS; POLYSTYRENES; TOLUENE; TRANSMISSION ELECTRON MICROSCOPY;

DEWETTING PROCESS; DIFFERENT SOLVENTS; HYDROGEN BONDING INTERACTIONS; MICELLAR SURFACES; POLYSTYRENE-B-POLY(ACRYLIC ACID) (PS-PAA); RE ASSEMBLIES; SOLVENT EVAPORATION; SPHERICAL MICELLES;

MICELLES;

BLOCK COPOLYMER; POLYACRYLIC ACID; POLYSTYRENE; SOLVENT;

EID: 70449497950     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2009.10.031     Document Type: Article

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