Fabrication, characterization and analysis of a microaxicon

Journal of Optics A: Pure and Applied Optics

Volumn 11, Issue 8, 2009, Pages

  Kuang, Dengfeng ^a   Ellmer, Uta ^b   Gui, Min ^a   Fang, Zhiliang ^a  

^a NANKAI UNIVERSITY   (China)

^b ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Bessel beam; Direct laser writing; Inductively coupled plasma etching; Microaxicon

Indexed keywords

BESSEL BEAM; DIRECT LASER WRITING; FRESNEL DIFFRACTION INTEGRAL; GRAY SCALE; HIGH QUALITY; INTENSITY DISTRIBUTION; MEASUREMENT RESULTS; MICROAXICON; OPTICAL MEASUREMENT; PROPAGATION DISTANCES; QUARTZ SUBSTRATE; THEORETICAL CALCULATIONS; WORKING DISTANCES;

ATOMIC FORCE MICROSCOPY; BESSEL FUNCTIONS; CAMERAS; DIFFRACTION; FABRICATION; GEOMETRICAL OPTICS; LASER BEAMS; LASERS; OPTICAL DATA PROCESSING; OXIDE MINERALS; PHOTORESISTS; PLASMA ETCHING; QUARTZ;

INDUCTIVELY COUPLED PLASMA;

EID: 70449380024     PISSN: 14644258     EISSN: 17413567     Source Type: Journal    
DOI: 10.1088/1464-4258/11/8/085601     Document Type: Article

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