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Volumn , Issue , 2009, Pages 193-196
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Metallization of high aspect ratio, out of plane structures
a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVE ELECTRODES;
BRAIN TISSUE;
ELECTROCHEMICAL MEASUREMENTS;
ELECTRODE FABRICATION;
HIGH ASPECT RATIO;
METALLIZATION PROCESS;
METALLIZATIONS;
NEURONAL CELL;
ON CHIPS;
OUT-OF-PLANE;
RECORDED SIGNALS;
SIDE WALLS;
SURFACE AREA;
THREE-DIMENSIONAL STRUCTURE;
CELL CULTURE;
ELECTRIC CORONA;
ELECTRODES;
INDOOR AIR POLLUTION;
METALLIZING;
SENSORS;
SIGNAL TO NOISE RATIO;
ASPECT RATIO;
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EID: 70449378002
PISSN: None
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1109/IWASI.2009.5184794 Document Type: Conference Paper |
Times cited : (3)
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References (7)
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