Advanced process & product reliability development in fabless environment

IEEE International Reliability Physics Symposium Proceedings

Volumn , Issue , 2009, Pages 236-243

  Verma, Gautam ^a   Wu, Kenneth ^b   Euzent, Bruce ^a   Cheng, Huang ^a  

^a ALTERA CORPORATION   (United States)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS; ADVANCED TECHNOLOGY; FABLESS; MANUFACTURING IS; PRODUCT RELIABILITY; RELIABILITY DATA; TECHNOLOGY DEVELOPMENT;

FIELD PROGRAMMABLE GATE ARRAYS (FPGA); FOUNDRY PRACTICE; TECHNOLOGICAL FORECASTING; TECHNOLOGY;

RELIABILITY;

EID: 70449130539     PISSN: 15417026     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IRPS.2009.5173256     Document Type: Conference Paper

References (2)

1. 2 SRAM Cell", IEDM 2007
2. Robin C.J. Wang, K.S. Chang-Liao, T.K. Wang, M.N. Chang, C.S. Wang, C.H. Lin, C.C. Lee, C.C. Chiu, Kenneth Wu, "Electrical Conduction and TDDB Reliability Characterization for Low-K SiCO Dielectric in Cu Interconnects, "Thin Solid Films, pp.1230-1233, (2008) 517