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Volumn 96, Issue 7, 2004, Pages 3687-3691

Onset of implant-related recombination in self-ion implanted and annealed crystalline silicon

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH FROM MELT; ELECTRON ENERGY LEVELS; ETCHING; ION IMPLANTATION; SILICON WAFERS; SOLUBILITY;

CRYSTALLINE SILICON; DEEP LEVEL TRANSIENT SPECTROSCOPY (DLTS); RESIDUAL DEFECTS; SILICON INTERSTITIALS;

CRYSTALLINE MATERIALS;

EID: 7044226010 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1789630 Document Type: Article

Times cited : (33)

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