High quality epitaxial FeSe0.5Te0.5 thin films grown on SrTiO3 substrates by pulsed laser deposition

Superconductor Science and Technology

Volumn 22, Issue 10, 2009, Pages

  Bellingeri, E ^a   Buzio, R ^a   Gerbi, A ^a   Marre D ^a,c   Congiu, S ^a   Cimberle, M R ^b   Tropeano, M ^a,b   Siri, A S ^a,c   Palenzona, A ^a,c   Ferdeghini, C ^a  

^a Laboratory of Innovative and Artificial Materials Genoa   (Italy)

^b IMEM CNR   (Italy)

^c UNIVERSITY OF GENOA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL TEMPERATURES; EXPERIMENTAL TECHNIQUES; FILM SURFACES; HIGH PURITY; HIGH QUALITY; MAIN PARAMETERS; METALLIC BEHAVIORS; OPTIMAL CONDITIONS; SAMPLE MORPHOLOGY; SRTIO; SUBSTRATE TEMPERATURE; SUPERCONDUCTING CRITICAL TEMPERATURES; TARGET VALUES; TEMPERATURE RANGE; X-RAYS DIFFRACTION;

ATOMIC FORCE MICROSCOPY; CRYSTAL GROWTH; DIFFRACTION; EPITAXIAL FILMS; EPITAXIAL GROWTH; FILM GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; PULSED LASER DEPOSITION; SCANNING TUNNELING MICROSCOPY; STRONTIUM ALLOYS; SUPERCONDUCTIVITY; TELLURIUM COMPOUNDS; TEMPERATURE;

SUBSTRATES;

EID: 70350701880     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/22/10/105007     Document Type: Article

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