Frustration of direct photoionization of Ar clusters in intense extreme ultraviolet pulses from a free electron laser

Journal of Physics B: Atomic, Molecular and Optical Physics

Volumn 42, Issue 13, 2009, Pages

  Iwayama, H ^a,b   Nagaya, K ^a,b   Yao, M ^a,b   Fukuzawa, H ^b,c   Liu, X J ^b,c   Prumper G ^b,c   Okunishi, M ^c   Shimada, K ^c   Ueda, K ^b,c   Harada, T ^c   Toyoda, M ^c   Yanagihara, M ^c   Yamamoto, M ^c   Motomura, K ^b,d   Saito, N ^b,d   Rudenko, A ^b,e   Ullrich, J ^e,f   Foucar, L ^g   Czasch, A ^g   Dorner R ^g   Nagasono, M ^b   Higashiya, A ^b   Yabashi, M ^b   Ishikawa, T ^b   Ohashi, H ^b,h   Kimura, H ^b,h   more..

^a KYOTO UNIVERSITY   (Japan)

^b RIKEN   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

^d NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^e Max Planck Advanced Study Group at CFEL   (Germany)

^f MAX PLANCK INSTITUT FÜR KERNPHYSIK   (Germany)

^g GOETHE UNIVERSITY   (Germany)

^h JAPAN SYNCHROTRON RADIATION RESEARCH INSTITUTE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLUSTER SIZES; COULOMB POTENTIAL; EXTREME ULTRAVIOLET PULSE; EXTREME-ULTRAVIOLET FREE-ELECTRON LASERS; FRAGMENT IONS; HIGHLY-IONIZED; ION KINETIC ENERGY; MULTIPLE IONIZATION; SIZE DEPENDENCE; SMALL CLUSTERS;

ELECTRIC FIELDS; ELECTRON ENERGY LOSS SPECTROSCOPY; FREE ELECTRON LASERS; IONS; KINETIC ENERGY; LASERS; PHOTOIONIZATION; PULSED LASER APPLICATIONS; ULTRAVIOLET DEVICES;

ELECTRONS;

EID: 70350692155     PISSN: 09534075     EISSN: 13616455     Source Type: Journal    
DOI: 10.1088/0953-4075/42/13/134019     Document Type: Article

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