Novel process windows - gates to maximizing process intensification via flow chemistry

Chemical Engineering and Technology

Volumn 32, Issue 11, 2009, Pages 1641-

  Hessel, Volker ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 70350650701     PISSN: 09307516     EISSN: 15214125     Source Type: Journal    
DOI: 10.1002/ceat.200990054     Document Type: Article

References (1)

1. D. M. Roberge et al., Chem. Eng. Technol. 2005, 28 (3), 318.