Effects of well-defined magnetic field gradients on the electrodeposition of copper and bismuth

Electrochemistry Communications

Volumn 11, Issue 11, 2009, Pages 2241-2244

  Tschulik, Kristina ^a   Koza, Jakub Adam ^a   Uhlemann, Margitta ^a   Gebert, Annett ^a   Schultz, Ludwig ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Deposit structuring; Field gradient force; Lorentz force; Magnetic field gradient; Magnetoelectrodeposition

Indexed keywords

DEPOSIT STRUCTURES; DEPOSIT THICKNESS; FIELD GRADIENT FORCE; MAGNETIC FIELD GRADIENT; MAGNETIC FLUX DENSITIES; MAGNETIC GRADIENT; MAGNETOELECTRODEPOSITION; STRUCTURING EFFECTS;

BISMUTH; DEPOSITS; ELECTRODEPOSITION; LORENTZ FORCE; MAGNETIC FLUX; MAGNETIC MATERIALS;

MAGNETIC FIELD EFFECTS;

EID: 70350566023     PISSN: 13882481     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elecom.2009.09.041     Document Type: Article

References (22)

1. Fahidy T.Z. J. Appl. Electrochem. 13 (1983) 553
2. Tacken R.A., and Janssen L.J.J. J. Appl. Electrochem. 25 (1995) 1
3. Coey J.M.D., and Hinds G. J. Alloys Compds. 326 (2001) 238
4. Grant K.M., Hemmert J.W., and White H.S. Electrochem. Commun. 1 (1999) 319
5. Devos O., Olivier A., Chopart J.P., Aaboubi O., and Maurin G. J. Electrochem. Soc. 145 (1998) 401
6. Koza J.A., Uhlemann M., Gebert A., and Schultz L. J. Electroanal. Chem. 617 (2008) 194
7. Diao Z., Dunne P.A., Zangari G., and Coey J.M.D. Electrochem. Commun. 11 (2009) 740
8. Mohanta S., and Fahidy T.Z. J. Appl. Electrochem. 8 (1978) 265
9. Ragsdale S.R., Grant K.M., and White H.S. J. Am. Chem. Soc. 120 (1998) 13461
10. Kishioka S., Yamada A., and Aogaki R. Electroanalysis 13 (2001) 1161
11. Chaure N., Rhen F., Hilton J., and Coey J. Electrochem. Commun. 9 (2007) 155
12. Chaure N.B., and Coey J.M.D. J. Electrochem. Soc. 156 (2009) F39
13. Devos O., and Aogaki R. Anal. Chem. 72 (2000) 2835
14. Aogaki R., Ito E., and Ogata M. J. Solid State Electrochem. 11 (2007) 757
15. Hinds G., Spada F.E., Coey J.M.D., Ni Mhiochain T.R., and Lyons M.E.G. J. Phys. Chem. B 105 (2001) 9487
16. Tanimoto Y., Katsuki A., Yano H., and Watanabe S. J. Phys. Chem. A 101 (1997) 7359
17. Sugiyama A., Hashiride M., Morimoto R., Nagai Y., and Aogaki R. Electrochim. Acta 49 (2004) 5115
18. O.Yu. Gorobets, V.Yu. Gorobets, D.O. Derecha, O.M. Brukva, J. Phys. Chem. C 112 (2008) 3373.
19. Sueptitz R., Koza J., Uhlemann M., Gebert A., and Schultz L. Electrochim. Acta 54 (2009) 2229
20. Winand R. Electrochim. Acta 39 (1994) 1091
21. Koza J.A., Uhlemann M., Gebert A., and Schultz L. Electrochem. Commun. 10 (2008) 1330
22. Prasad M., Kanekar C.R., and Mulay L.N. J. Chem. Phys. 19 (1951) 1440