Nanosized BiVO4 with high visible-light-induced photocatalytic activity: Ultrasonic-assisted synthesis and protective effect of surfactant

Journal of Hazardous Materials

Volumn 172, Issue 1, 2009, Pages 338-344

  Shang, Meng ^a   Wang, Wenzhong ^a   Zhou, Lin ^a   Sun, Songmei ^a   Yin, Wenzong ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

BiVO4; Nanosize; PEG; Ultrasonic; Visible light photocatalysis

Indexed keywords

BAND GAPS; BET SURFACE AREA; BIVO4; CRYSTAL SIZE; NANO-SIZED; NANOSIZE; ORGANIC DYE; PEG; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC EFFICIENCY; PHOTOCATALYTIC PERFORMANCE; PROTECTIVE EFFECTS; ULTRASONIC IRRADIATION; VISIBLE LIGHT; VISIBLE-LIGHT PHOTOCATALYSIS; VISIBLE-LIGHT-DRIVEN;

CHEMICAL OXYGEN DEMAND; DEGRADATION; IRRADIATION; OXYGEN; PHOTOCATALYSIS; POLYETHYLENE OXIDES; SURFACE ACTIVE AGENTS; SYNTHESIS (CHEMICAL); ULTRASONICS;

POLYETHYLENE GLYCOLS;

BISMUTH VANADATE; MACROGOL; NANOPARTICLE; RHODAMINE B; SURFACTANT; UNCLASSIFIED DRUG; BISMUTH; BISMUTH VANADIUM TETRAOXIDE; COLORING AGENT; MACROGOL DERIVATIVE; ORGANIC COMPOUND; OXYGEN; VANADIC ACID;

CATALYSIS; CATALYST; CRYSTALLINITY; IRRADIATION; PHOTOLYSIS; REDUCTION; SURFACE AREA; SURFACTANT; ULTRASONICS;

ARTICLE; BIOCATALYST; CHEMICAL OXYGEN DEMAND; CONTROLLED STUDY; CRYSTAL STRUCTURE; DECOLORIZATION; ORGANIC POLLUTION; PHOTOCATALYSIS; PHOTODEGRADATION; SOLID STATE; SURFACE PROPERTY; ULTRASOUND; CATALYSIS; CHEMICAL MODEL; CHEMISTRY; LIGHT; METHODOLOGY; NANOTECHNOLOGY; PHOTOCHEMISTRY; SCANNING ELECTRON MICROSCOPY; TEMPERATURE;

BISMUTH; CATALYSIS; COLORING AGENTS; LIGHT; MICROSCOPY, ELECTRON, SCANNING; MODELS, CHEMICAL; NANOPARTICLES; NANOTECHNOLOGY; ORGANIC CHEMICALS; OXYGEN; PHOTOCHEMISTRY; POLYETHYLENE GLYCOLS; SURFACE-ACTIVE AGENTS; TEMPERATURE; ULTRASONICS; VANADATES;

EID: 70350534227     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2009.07.017     Document Type: Article

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