Effect of gas composition on metal surface cleaning using atmospheric pressure microwave plasma

Thin Solid Films

Volumn 518, Issue 3, 2009, Pages 981-986

  Ono, Shigeru ^a   Teii, Shinriki ^a   Suzuki, Yuta ^a   Suganuma, Takuya ^a  

^a TOKYO CITY UNIVERSITY   (Japan)

Author keywords

Atmospheric pressure plasma; H2O; O radical; O2; OH radical; Plasma cleaning; Water contact angle

Indexed keywords

ATMOSPHERIC PRESSURE PLASMA; H2O; O RADICAL; O2; OH RADICAL; PLASMA CLEANING; WATER CONTACT ANGLE;

AIR CLEANERS; ATMOSPHERIC COMPOSITION; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CONTACT ANGLE; FREE RADICALS; METAL CLEANING; MICROWAVES; PLASMA DIAGNOSTICS; PLASMA SOURCES; PRESSURE EFFECTS; SIZE DISTRIBUTION; STAINLESS STEEL;

SURFACE CLEANING;

EID: 70350515496     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.07.175     Document Type: Article

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