Distinct ribotypes and rates of antimicrobial drug resistance in Clostridium difficile from Shanghai and Stockholm

Clinical Microbiology and Infection

Volumn 15, Issue 12, 2009, Pages 1170-1173

  Huang, H ^a,b   Fang, H ^b   Weintraub, A ^b   Nord, C E ^b  

^a FUDAN UNIVERSITY   (China)

^b KAROLINSKA UNIVERSITY HOSPITAL   (Sweden)

Author keywords

Antimicrobial susceptibility; Clostridium difficile; PCR ribotyping; Toxin profile

Indexed keywords

CLINDAMYCIN; DNA TOPOISOMERASE (ATP HYDROLYSING) A; DNA TOPOISOMERASE (ATP HYDROLYSING) B; ERYTHROMYCIN; FUSIDIC ACID; GENE PRODUCT; METRONIDAZOLE; PROTEIN ERMB; PROTEIN TETM; QUINOLINE DERIVED ANTIINFECTIVE AGENT; RIFAMPICIN; TETRACYCLINE; UNCLASSIFIED DRUG; VANCOMYCIN;

ANTIBIOTIC RESISTANCE; ARTICLE; BACTERIAL STRAIN; BACTERIUM ISOLATE; CHINA; CLOSTRIDIUM DIFFICILE; CONTROLLED STUDY; DRUG SENSITIVITY; GENE IDENTIFICATION; GENOTYPE; MINIMUM INHIBITORY CONCENTRATION; NONHUMAN; PHENOTYPE; POLYMERASE CHAIN REACTION; PRIORITY JOURNAL; SWEDEN;

CLOSTRIDIUM DIFFICILE;

EID: 70350351716     PISSN: 1198743X     EISSN: 14690691     Source Type: Journal    
DOI: 10.1111/j.1469-0691.2009.02992.x     Document Type: Article

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