Patterning submicron features on flexible plastic substrates by optical lithography

Materials Research Society Symposium Proceedings

Volumn 1030, Issue , 2008, Pages 47-53

  Péter, Mária ^a   De Laat, Wim ^b   Giesen, Peter T M ^a   Gui, Cheng Qun ^b   Meinders, Erwin R ^a  

^a TNO   (Netherlands)

^b ASML   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSION; DIMENSIONAL INSTABILITY; FLEXIBLE PLASTIC SUBSTRATES; FLEXIBLE POLYMERS; FOIL LAMINATION; IMAGING CONDITIONS; IMAGING EXPERIMENTS; MATERIAL PROPERTY; MATRIX; MOISTURE UPTAKE; OPTICAL LITHOGRAPHY; POLYETHYLENE NAPHTHALATE; PROCESS WINDOW; SEM ANALYSIS; STEP-AND-REPEAT; SUBMICROMETERS; SUBMICRON; SURFACE FLATNESS;

DIMENSIONAL STABILITY; MICROMETERS; PHOTOLITHOGRAPHY;

SUBSTRATES;

EID: 70350326066     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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