Phonon confinement in stressed silicon nanocluster

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 9, 2009, Pages 5604-5607

  Sahoo, Satyaprakash ^a   Dhara, S ^a   Mahadevan, S ^a   Arora, A K ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Ion implantation; Phonon confinement; Raman spectroscopy; Si nanocluster

Indexed keywords

BEAM IMPLANTATIONS; BLUE SHIFT; COMPLEX FREQUENCY MODELS; CONFINED ACOUSTIC PHONONS; OPTICAL PHONONS; PHONON CONFINEMENT; RAMAN LINE SHAPES; RAMAN SHIFT; RED SHIFT; SI NANOCLUSTER; SI NANOPARTICLES; SIZE DEPENDENT; STRESSED SILICON; TEM;

ACOUSTIC SPECTROSCOPY; ACOUSTICS; CORUNDUM; ION BOMBARDMENT; ION IMPLANTATION; LATTICE VIBRATIONS; NANOCLUSTERS; NANOPARTICLES; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON;

PHONONS;

EID: 70350159288     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.1141     Document Type: Conference Paper

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