Non-alloyed schottky and ohmic contacts to as-grown and oxygen-plasma treated n-type SnO2 (110) and (101) thin films

Applied Physics Express

Volumn 2, Issue 10, 2009, Pages

  Bierwagen, Oliver ^a   White, Mark E ^a   Tsai, Min Ying ^a   Nagata, Takahiro ^b   Speck, James S ^a  

^a University of California   (United States)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALL METAL; AS-GROWN; CONTACT PROPERTIES; CURRENT-VOLTAGE MEASUREMENTS; HIGH QUALITY; NEAR-SURFACE; OXYGEN PLASMA TREATMENTS; OXYGEN PLASMAS; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; SCHOTTKY; SCHOTTKY BARRIERS; SCHOTTKY CONTACTS; SPECIFIC CONTACT RESISTANCES; TIN OXIDE THIN FILM;

CONTACT RESISTANCE; CRYSTAL GROWTH; EPITAXIAL FILMS; MERCURY (METAL); MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; OHMIC CONTACTS; OXIDE FILMS; OXYGEN; PLASMA APPLICATIONS; PLATINUM; SCHOTTKY BARRIER DIODES; TANTALUM; TIN;

PLASMAS;

EID: 70350145700     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.2.106502     Document Type: Article

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