Improved capacitive behavior of MnO 2 thin films prepared by electrodeposition on the PT substrate with a MnO x buffer layer

Functional Materials Letters

Volumn 2, Issue 1, 2009, Pages 13-18

  Xia, H ^a   Xiao, W ^a   Lai, M O ^a   Lu, L ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

electrodeposition; MnO 2; supercapacitor; thin film

Indexed keywords

AG/AGCL; CAPACITIVE BEHAVIOR; CYCLE PERFORMANCE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MNO 2; NANO-STRUCTURED; PSEUDOCAPACITIVE; RATE CAPABILITIES; REFERENCE ELECTRODES; SCAN RATES; SPECIFIC CAPACITANCE; SUPER CAPACITOR; SUPERCAPACITOR APPLICATION; THIN-FILM ELECTRODE; VOLTAGE WINDOW;

ADHESION; BUFFER LAYERS; CAPACITORS; CYCLIC VOLTAMMETRY; DEPOSITION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL PROPERTIES; ELECTRODEPOSITION; FIELD EMISSION MICROSCOPES; FILM PREPARATION; PHOTOELECTRON SPECTROSCOPY; PLATINUM; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SODIUM; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

MANGANESE OXIDE;

EID: 70349980064     PISSN: 17936047     EISSN: 17937213     Source Type: Journal    
DOI: 10.1142/S1793604709000478     Document Type: Article

References (20)

1. S. Sarangapani, B. V. Tilak and C. P. Chen, J. Electrochem. Soc. 143, 3791 (1996).
2. R. Kotz and M. Carlen, Electrochim. Acta 45, 2483 (2000).
3. Y. Z. Zheng, H. Y. Ding and M. L. Zhang, Thin Solid Films 516, 7381 (2008).
4. S. L. Chou, F. Y. Cheng and J. Chen, J. Power Sources 162, 727 (2006).
5. N.Nagarajan and I. Zhitomirsky, J. Appl. Electrochem. 36, 1399 (2006).
6. S. L. Chou et al., J. Power Sources 182, 359 (2008).
7. D. D. Zhao, W. J. Zhou and H. L. Li, Chem. Mater. 19, 3882 (2007).
8. G. Lota et al., Chem. Phys. Lett. 434, 73 (2007).
9. J. Chang et al., Electrochem. Solid-State Lett. 11, A9 (2008).
10. R. S. Mane et al., Curr. Appl. Phys. 9, 87 (2009).
11. C. L. Chen et al., Mater. Chem. Phys. 95, 84 (2006).
12. D. Choi, G. E. Blomgren and P. N. Kumta, Adv. Mater. 18, 1178 (2006).
13. M. W. Xu et al., J. Phys. Chem. C 111, 19141 (2007).
14. X. Wang and Y. D. Li, J. Am. Chem. Soc. 124, 2880 (2002).
15. K. R. Prasad and N. Miura, J. Power Sources 135, 354 (2004).
16. J. N. Broughton and M. J. Brett, Electrochim. Acta 50, 4814 (2005).
17. S. Devaraj and N. Munichandraiah, J. Phys. Chem. C 112, 4406 (2008).
18. W. F. Wei et al., J. Phys. Chem. C 112, 15075 (2008).
19. N. Nagarajan, H. Humadi and I. Zhitomirsky, Electrochim. Acta 51, 3039 (2006).
20. B. Djurfors et al., Acta Mater. 53, 957 (2005).