Change in water contact angle of carbon contaminated TiO2 Surfaces by High-energy Electron Beam

Bulletin of the Korean Chemical Society

Volumn 30, Issue 5, 2009, Pages 1067-1070

  Kim, Kwang Dae ^a   Tai, Wei Sheng ^a   Kim, Young Dok ^a   Cho, Sang Jin ^a   Bae, In Seob ^a   Boo, Jin Hyo ^a   Lee, Byung Cheol ^b   Yang, Ki Ho ^b   Park, Ok Kyung ^b  

^a Sungkyunkwan University   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

Author keywords

Electron beam; TiO2; Water contact angle

Indexed keywords

ELECTRON BEAMS; PHOTONS; TITANIUM DIOXIDE;

CONDITION; E-BEAMS; ELECTRON-BEAM; ELECTRON-BEAM TREATMENT; HIGH ENERGY ELECTRON BEAMS; OH -; OXIDE SURFACE; TIO 2; WATER CONTACT ANGLE; WATER CONTACTS;

WETTING;

EID: 70349742905     PISSN: 02532964     EISSN: 12295949     Source Type: Journal    
DOI: 10.5012/bkcs.2009.30.5.1067     Document Type: Article

References (20)

1. Feng, X.; Feng, L.; Jin, M.; Zhai, J.; Jiang, L.; Zhu, D. J. Am. Chem. Soc. 2004, 126, 62.
2. 2 Photocatalysts, Fundamentals and Applications; BKC Inc.: Tokyo, 1999; pp 66-77.
3. Wang, R.; Hashimoto, K.; Fujishima, A.; Chikuni, M.; Kojima, E.; Kitamura, A.; Shimohigoshi, M.; Watanabe, T. Nature 1997, 388, 4310432.
4. Mills, A.; Crow, M. J. Photoenergy 2008, 470670.
5. Irie, H.; Tsuji, K.-I.; Hashimoto, K. Phys. Chem. Chem. Phys. 2008, 10, 3072.
6. Feng, X.; Zhai, J.; Jiang, L. Angew. Chem. Int. Ed. 2005, 44, 5115.
7. Irie, H.; Ping, T. S.; Shibata, T.; Hashimoto, K. Electrochem. Solid-State Lett. 2008, 8, D-23-D25.
8. Hwang, Y. K.; Patil, K. R.; Kim, H.-K.; Sathaye, S. D.; Hwang, J.-S.; Park, S.-E.; Chang, J.-S. Bull. Kor. Chem. Soc. 2005, 26, 1515.
9. Shibata, T.; Sakai, N.; Fukuda, K.; Ebina, Y.; Sasaki, T. Phys. Chem. Chem. Phys. 2007, 9, 2413.
10. Wenzel, R. N. Ind. Eng. Chem. 1936, 28, 988.
11. Gan, W. Y.; Lam, S. W.; Chiang, K.; Amal, R.; Zhao, H.; Brungs, M. P. J. Mater. Chem. 2007, 17, 952.
12. Ertl, G.; Küppers, J. Low Energy Electrons and Surface Chemistry; VCH Verlagsgesellschagft: Weinheim, 1985; p 76.
13. Kim, Y. D.; Stultz, J.; Goodman, D. W. Langmuir 2002, 18, 3999.
14. Fleming, L.; Fulton, C. C.; Lucovsky, G.; Rowe, J. E.; Ulrich, M. D.; Lüning, J. J. Appl. Phys. 2007, 102, 033707.
15. Chen, X.; Burda, C. J. Am. Chem. Soc. 2009, 130, 5018-1019.
16. Wang, L.-Q.; Baer, D. R.; Engelhard, M. H.; Shultz, A. N. Surf. Sci. 1995, 344, 237.
17. Henderson, M. A. Langmuir 1996, 12, 5093.
18. Moulder, J. F.; Stickle, W. F.; Sobol P. E.; Bomben, K. D. In Handbook of X-ray Photoelectron Spectroscpy; Chastain, J.; King, R. C. Jr., Eds.; Physical Electronics, Inc.: Minnesota, 1995.
19. de la Puente, G.; Pis, J. J.; Menedez, J. A.; Grange, P. J. Anal. Appl. Pyrol. 1997, 43 125.
20. Cho, S. J.; Boo, J.-H. manuscript in preparation.