Electrochemical equilibria of copper in aqueous phosphoric acid solutions

Journal of the Electrochemical Society

Volumn 156, Issue 11, 2009, Pages

  Aksu, Serdar ^a  

^a SoloPower Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACID-WATER SYSTEM; AQUEOUS SOLUBILITY; AQUEOUS SOLUTIONS; COPPER ELECTRODES; COPPER ELECTROPOLISHING; ELECTROCHEMICAL BEHAVIORS; ELECTROPOLISHING; EXPERIMENTAL DATA; ORTHOPHOSPHORIC ACIDS; PHOSPHATE COMPLEXES; PHOSPHATE SALTS; POTENTIAL-PH DIAGRAMS; PREDOMINANCE REGIONS; SOLID FILMS; SOLUBILITY RANGE; STABILITY DOMAINS; TOTAL DISSOLVED COPPER;

ACIDS; COPPER; DISSOLUTION; ELECTROLYTIC POLISHING; GRAPHIC METHODS; INDUSTRIAL APPLICATIONS; PHOSPHORIC ACID; SOLUBILITY; SYSTEM STABILITY; TERNARY SYSTEMS;

COPPER COMPOUNDS;

EID: 70349728604     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3215996     Document Type: Article

References (62)

1. P. Singer, Semicond. Int. 6, 91 (1998).
2. J. M. Steigerwald, S. P. Murarka, and R. J. Gutmann, Chemical Mechanical Planarization of Microelectronic Materials, p. 19, John Wiley & Sons, New York (1997).
3. P. B. Zantye, A. Kumar, and A. K. Sikder, Mater. Sci. Eng. R. 45, 89 (2004).
4. K. R. Hebert, J. Electrochem. Soc. 148, C726 (2001).
5. A. C. West, H. Deligianni, and P. C. Andricacos, IBM J. Res. Dev. 49, 37 (2005).
6. S. Aksu, I. Emesh, and B. Basol, in Proceedings of CMP-MIC, Institute of Microelectronics Interconnection, Fremont, CA, p. 19 (2006).
7. S. Aksu, I. Emesh, and B. Basol, ECS Trans. 2 (6), 417 (2007).
8. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, p. 384, Pergamon, London (1965).
9. S. Aksu and F. M. Doyle, J. Electrochem. Soc. 148, B51 (2001).
10. S. Aksu and F. M. Doyle, J. Electrochem. Soc. 149, G352 (2002).
11. K. Osseo-Asare and K. K. Mishra, J. Electron. Mater. 25, 1599 (1996).
12. S. Aksu and F. M. Doyle, J. Electrochem. Soc. 149, B340 (2002)
13. S. Aksu and F. M. Doyle, in Electrochemistry in Mineral and Metal Processing, R. Woods, F. M. Doyle, and, S. Licht, Editors, PV 2000-12, p. 258, The Electrochemical Society Proceedings Series, Pennington, NJ (2000).
14. S. Tamilmani, W. Huang, S. Raghavan, and R. Small, J. Electrochem. Soc. 149, G638 (2002)
15. S. Aksu, J. Electrochem. Soc. 152, G938 (2005).
16. U. B. Patri, S. Aksu, and S. V. Babu, J. Electrochem. Soc. 153, G650 (2006).
17. G. M. Denison, A. O. Evans, C. A. Bessel, D. W. Skaf, R. W. Murray, and J. M. DeSimone, J. Electrochem. Soc. 152, B435 (2005).
18. A. Chiba and W. C. Wu, Plat. Surf. Finish. 79, 62 (1992).
19. M. Kanungo, K. G. Mishra, and S. C. Das, Minerals Eng. 16, 1383 (2003).
20. S. Jayakrushnan, R. M. Krishnan, S. Sriveeraragavan, N. Kaplana, and T. Umashankar, T. Met. Finish India, 6, 275 (1997).
21. V. R. K. Gorantla, A. Babel, S. Pandija, and S. V. Babu, Electrochem. Solid-State Lett. 8, G131 (2005).
22. T. M. Pan, T. F. Lei, F. H. Ko, T. S. Chao, T. H. Chiu, Y. H. Lee, and C. P. Lu, IEEE Trans. Semicond. Manuf. 4, 365 (2001).
23. C. Gabrielli, C. Mace, J. Martha, S. Mege, and E. Ostermann, Solid State Phenom. 103-104, 287 (2005).
24. D. Padhi, J. Yahalom, S. Gandikota, and G. Dixit, J. Electrochem. Soc. 150, G10 (2003).
25. J. Huo, R. Solanki, and J. McAndrew, J. Mater. Eng. Perform. 13, 413 (2004).
26. S. -H. Liu, J. -M. Shieh, C. Chen, K. Hensen, and S. -S. Cheng, J. Electrochem. Soc. 153, C428 (2006).
27. F. Q. Liu, L. Chen, A. Duboust, S. Tsai, A. Manens, Y. Wang, and W. -Y. Hsu, Mater. Res. Soc. Symp. Proc. 867, W9.1 (2005).
28. F. Q. Liu, S. D. Tsai, Y. Hu, S. S. Neo, Y. Wang, A. Duboust, and L. -Y. Chen, U.S. Pat. 7,128,825 (2006).
29. M. Pourbaix, Lectures on Electrochemical Corrosion, p. 49, Plenum, New York (1973).
30. W. Stumm and J. J. Morgan, Aquatic Chemistry, p. 252, John Wiley & Sons, New York (1981).
31. M. W. Chase, J. Phys. Chem. Ref. Data 9, 1 (1998).
32. O. Kubaschewski, C. B. Alcock, and P. J. Spencer, Materials Thermochemistry, p. 363, Permagon, Oxford (1993).
33. I. Puigdomenech, J. A. Rard, A. V. Plyasunov, and I. Grenthe, in Modelling in Aquatic Chemistry, I. Grenthe, and, I. Puigdomenech, Editors, p. 427, OECD Nuclear Energy Agency, Paris (1997).
34. R. M. Smith and A. E. Martell, NIST Critically Selected Stability Constants of Metal Complexes Database Software, Version 8.0 (2004).
35. L. Ciavatta, M. Iuliano, and R. Porto, Ann. Chim. (Rome), 83, 39 (1993).
36. I. Puigdomenech and C. Tax́n, Technical Report no. TR-00-13, Swedish Nuclear Fuel and Waste Management Co. p. 72 (Aug 2000).
37. S. Ghose, Acta Crystallogr. 16, 124 (1963).
38. R. L. Frost, P. A. Williams, W. Martens, J. T. Kloprogge, and P. Levertt, J. Raman Spectrosc. 33, 260 (2002).
39. R. L. Frost, P. A. Williams, W. Martens, J. T. Kloprogge, and P. Levertt, Spectrochim. Acta, Part A. 58, 2861 (2002).
40. G. L. Shoemaker, J. B. Anderson, and E. Kostiner, Acta Crystallogr. Sect. B: Struct. Crystallogr. Cryst. Chem 33, 2969 (1977).
41. J. W. Ball and D. K. Nordstrom, WATEQ4F Database, U.S. Geological Survey, Menlo Park, CA (1991).
42. M. R. Schock, D. A. Lytle, and J. A. Clement, EPA Report no. EPA/600/R-96/085, U.S. Environmental Protection Agency (June 1995).
43. D. D. Wagman, W. H. Evans, V. B. Parker, R. H. Schumm, I. Halow, S. M. Bailey, K. L. Churney, and R. L. Nuttall, J. Phys. Chem. Ref. Data 11, 2 (1982).
44. S. Van Gils, C. Le Pen, A. HubH. Terryn, and E. Stijins, J. Electrochem. Soc. 154, C175 (2007).
45. W. C. Elmore, J. Appl. Phys. 10, 724 (1939).
46. E. C. Williams and M. Barrett, J. Electrochem. Soc. 103, 363 (1956).
47. S. -C. Chang, J. -M. Shieh, C. -C. Huang, B. -T. Dai, and M. -S. Feng, Jpn. J. Appl. Phys. Part 1. 41, 7332 (2002).
48. J. Mendez, R. Akolkar, T. Andryushchenko, and U. Landau, J. Electrochem. Soc. 155, D27 (2008).
49. S. H. Glarum and J. H. Marshall, J. Electrochem. Soc. 132, 2872 (1985).
50. B. Du and I. I. Suni, J. Electrochem. Soc. 151, C375 (2004).
51. R. Vidal and A. C. West, J. Electrochem. Soc. 142, 2682 (1995).
52. R. Vidal and A. C. West, J. Electrochem. Soc. 142, 2689 (1995).
53. T. P. Hoar and G. P. Rothwell, Electrochim. Acta, 9, 135 (1964).
54. K. Kojima and C. W. Tobias, J. Electrochem. Soc. 120, 1202 (1973).
55. M. Novak, A. K. N. Reddy, and H. Wroblowa, J. Electrochem. Soc. 117, 733 (1970).
56. J. L. Fang and N. J. Wu, J. Electrochem. Soc. 136, 3800 (1989).
57. M. Edwards, L. Hidmi, and D. Gladwell, Corros. Sci 44, 1057 (2002).
58. Y. Zhe and S. O. Pehkonen, Water Sci. Technol 49, 73 (2004).
59. S. Reiber, J. Am. Water Works Assoc 81, 114 (1989).
60. M. M. Laz, R. M. Souto, S. Gonzalez, R. C. Salverezza, and A. J. Arvia, Electrochim. Acta 37, 655 (1992).
61. L. P. Podgornova, Y. I. Kuznetsov, and S. V. Gavrilova, Zashch. Met 39, 248 (2003).
62. C. F. B. Coutinho, M. O. Silva, S. A. S. Machado, and L. H. Mazo, Appl. Surf. Sci. 253, 3270 (2007).