Controlled etching and regrowth of tunnel oxide for antenna-coupled metal-oxide-metal diodes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 5, 2009, Pages 2153-2160

  Tiwari, Badri ^a   Bean, Jeffrey A ^a   Szakmány, Gerg ^a   Bernstein, Gary H ^a   Fay, Patrick ^a   Porod, Wolfgang ^a  

^a University of Notre Dame   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNA-COUPLED; AR PLASMAS; CONTROLLED GROWTH; CURRENT VOLTAGE; DETECTIVITY; IN-SITU; INFRARED SENSOR; IR CHARACTERIZATION; IR MEASUREMENTS; METAL-OXIDE; MOM DIODES; PT ELECTRODE; TUNNEL OXIDE]; TUNNELING OXIDES;

ALUMINUM; ANTENNAS; DIODES; DISSIMILAR METALS; ELECTRODES; ELECTRON BEAMS; ETCHING; METHOD OF MOMENTS; PLATINUM; SENSORS; TUNNELING (EXCAVATION); WIND TUNNELS;

METALS;

EID: 70349696525     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3204979     Document Type: Article

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