Erratum: "Effects of low-temperature-buffer, rf-power, and annealing on structural and optical properties of ZnO/Al2O3 (0001) thin films grown by rf-magnetron sputtering" (Journal of Applied Physics (2009) 106 (023511))

Journal of Applied Physics

Volumn 106, Issue 6, 2009, Pages

  Liu, H F ^a   Chua, S J ^a  

^a INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 70349647719     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3238261     Document Type: Erratum

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