Dielectric properties of Li2 O-3 B2 O3 glasses

Journal of Applied Physics

Volumn 106, Issue 6, 2009, Pages

  Vaish, Rahul ^a   Varma, K B R ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CORRELATED BARRIER HOPPING MODELS; DC CONDUCTIVITY; DIELECTRIC CONSTANTS; ELECTRIC MODULUS FORMALISM; ELECTRICAL CONDUCTIVITY; ELECTRICAL RELAXATIONS; ELECTRICAL TRANSPORT; ELECTRODE MATERIAL; FREQUENCY DEPENDENT; FREQUENCY EXPONENT; FREQUENCY RANGES; GLASS MATRICES; LOW FREQUENCY; NON-LINEAR OPTICAL; POWER LAW; TEMPERATURE DEPENDENCE; TEMPERATURE DEPENDENT BEHAVIOR; TRANSPARENT GLASS;

ACTIVATION ENERGY; CERAMIC CAPACITORS; DIELECTRIC RELAXATION; DIELECTRIC WAVEGUIDES; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL ELECTRODES; GLASS; PERMITTIVITY;

ELECTRIC NETWORK ANALYSIS;

EID: 70349634004     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3225583     Document Type: Article

References (27)

1. R. Guo and A. S. Bhalla, J. Appl. Phys. 0021-8979 66, 6186 (1989). 10.1063/1.343556
2. Z. Lin, Z. Wang, C. Chen, and M. -H. Lee, J. Appl. Phys. 0021-8979 90, 5585 (2001). 10.1063/1.1413711 (Pubitemid 33599688)
3. I. Martynyuk-Lototska, T. Dudok, O. Mys, and R. Vlokh, Opt. Mater. (Amsterdam, Neth.) 0925-3467 31, 660 (2009). 10.1016/j.optmat.2008.06.020
4. T. Sasaki, Y. Mori, and M. Yoshimura, Opt. Mater. (Amsterdam, Neth.) 0925-3467 23, 343 (2003). 10.1016/S0925-3467(02)00316-6
5. V. Kityk, A. Majchrowski, J. Zmija, Z. Mierczyk, and K. Nounch, Cryst. Growth Des. 1528-7483 6, 2779 (2006). 10.1021/cg0602461
6. J. W. Kim, C. S. Yoon, and H. G. Gallagher, Appl. Phys. Lett. 0003-6951 71, 3212 (1997). 10.1063/1.120293
7. D. N. Nikogosyan, Appl. Phys. A: Solids Surf. 0721-7250 58, 181 (1994). 10.1007/BF00324374
8. R. Guo, S. A. Markgraf, Y. Furukawa, M. Sato, and A. S. Bhalla, J. Appl. Phys. 0021-8979 78, 7234 (1995). 10.1063/1.360435
9. H. R. Jung, B. M. Jin, J. W. Cha, and J. N. Kim, Mater. Lett. 0167-577X 30, 41 (1997). 10.1016/S0167-577X(96)00168-1
10. K. Otsuka, M. Funami, M. Ito, H. Katsuda, M. Tacano, M. Adachi, and A. Kawabata, Jpn. J. Appl. Phys., Part 1 0021-4922 34, 2646 (1995). 10.1143/JJAP.34.2646
11. S. Lin, Z. Sun, B. Wu, and C. Chen, J. Appl. Phys. 0021-8979 67, 634 (1990). 10.1063/1.345765
12. X. Liu, L. Qian, and F. W. Wise, Opt. Commun. 0030-4018 144, 265 (1997). 10.1016/S0030-4018(97)00367-2
13. K. S. Cole and R. H. Cole, J. Chem. Phys. 0021-9606 9, 341 (1941). 10.1063/1.1750906
14. A. K. Jonscher, Nature (London) 0028-0836 267, 673 (1977). 10.1038/267673a0
15. Z. Shuqing, H. Chaoen, and Z. Hongwu, J. Cryst. Growth 99, 805 (1990). 10.1016/S0022-0248(08)80030-9
16. D. Ming, J. M. Reau, J. Ravez, J. Gitae, and P. Hagenmuller, J. Solid State Chem. 0022-4596 116, 185 (1995). 10.1006/jssc.1995.1200
17. T. Matsuo, T. Yagami, and T. Katsumata, J. Appl. Phys. 0021-8979 74, 7264 (1993). 10.1063/1.354991
18. P. B. Macedo, C. T. Moynihan, and N. L. Laberge, Phys. Chem. Glasses 0031-9090 14, 122 (1973).
19. R. Kohlrausch, Pogg. Ann. Phys. 91, 179 (1854). 10.1002/andp.18541670203
20. G. Williams and D. C. Watt, Trans. Faraday Soc. 0014-7672 66, 80 (1970). 10.1039/tf9706600080
21. R. Bergman, J. Appl. Phys. 0021-8979 88, 1356 (2000). 10.1063/1.373824
22. K. L. Ngai, R. W. Rendell, and H. Jain, Phys. Rev. B 0163-1829 30, 2133 (1984). 10.1103/PhysRevB.30.2133
23. M. Kim, H. W. Choi, H. W. Park, and Y. S. Yang, Mater. Sci. Eng., A 0921-5093 449-451, 306 (2007). 10.1016/j.msea.2006.02.249 (Pubitemid 46299773)
24. S. Murugavel and B. Roling, Phys. Rev. B 0163-1829 76, 180202 (R) (2007). 10.1103/PhysRevB.76.180202
25. A. Ghosh, Phys. Rev. B 0163-1829 42, 1388 (1990). 10.1103/PhysRevB.42. 1388
26. K. L. Ngai and A. K. Rizos, Phys. Rev. Lett. 0031-9007 76, 1296 (1996). 10.1103/PhysRevLett.76.1296
27. A. Pan and A. Ghosh, Phys. Rev. B 0163-1829 62, 3190 (2000). 10.1103/PhysRevB.62.3190