Selective growth and chracterization of InGaAs quantum dots on patterned InP substrates utilizaing a diblock copolymer template

Conference Proceedings - International Conference on Indium Phosphide and Related Materials

Volumn , Issue , 2009, Pages 52-54

  Park, J H ^a   Kirch, J ^a   Liu, C C ^a   Rathi, M K ^a   Mawst, L J ^a   Nealey, P F ^a   Kuech, T F ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE REGIONS; DIBLOCK COPOLYMER; DIBLOCK COPOLYMER TEMPLATES; DIODE LASERS; FORMATION MECHANISM; HIGHER TEMPERATURES; INGAAS QUANTUM DOTS; INGAASP/INP; INP SUBSTRATES; MOCVD; MOCVD GROWTH; NANO PATTERN; NANOPATTERNING; PATTERNED SUBSTRATES; QUANTUM DOTS; REACTIVE ION ETCH; SELECTIVE GROWTH; SELF-ASSEMBLED;

BLOCK COPOLYMERS; CHEMICAL VAPOR DEPOSITION; COPOLYMERIZATION; INDIUM PHOSPHIDE; SEMICONDUCTING INDIUM; SILICON NITRIDE; SUBSTRATES;

SEMICONDUCTOR QUANTUM DOTS;

EID: 70349483951     PISSN: 10928669     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICIPRM.2009.5012413     Document Type: Conference Paper

References (0)