Diagnostics of SiCOH-film-deposition in the dielectric barrier discharge at atmospheric pressure

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Vinogradov, Igor ^a   Zimmer, Daniel ^a   Lunk, Achim ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Deposition rate; Dielectric barrier discharge (DBD); FT IR absorption spectroscopy; Optical emission spectroscopy; Plasma polymerization; XPS

Indexed keywords

AFM; DIELECTRIC BARRIER DISCHARGE (DBD); DIELECTRIC BARRIER DISCHARGES; FT-IR ABSORPTION SPECTROSCOPY; IR ABSORPTION SPECTROSCOPY; NONTHERMAL; PARALLEL PLATE REACTORS; REACTION PRODUCTS; RESIDENCE TIME; XPS; XPS ANALYSIS;

ABSORPTION; ANGLE MEASUREMENT; ATMOSPHERIC PRESSURE; CONTACT ANGLE; DEPOSITION RATES; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FLOW CONTROL; INFRARED ABSORPTION; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; PHOTORESISTS; PLASMA DEPOSITION; PLASMA POLYMERIZATION; PLASMAS; POLYMER FILMS; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; SILICON WAFERS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SURFACE TENSION; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION SPECTROSCOPY;

EID: 70349429828     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200731202     Document Type: Conference Paper

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