Nanogranular SnO2 layers for gas sensing applications by in situ deposition of nanoparticles produced by the Karlsruhemicrowave plasma process

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Schumacher, Benedikt ^a   Ochs, Rolf ^a   Tröße, Harald ^a   Schlabach, Sabine ^a   Bruns, Michael ^a   Szabó, Dorothée V ^a   Haußelt, Jürgen ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Gas sensors; Nanocrystalline films; Nanoparticles; Silicon oxide; Tin oxide

Indexed keywords

ACTIVE SURFACE AREA; GAS SENSING APPLICATIONS; GAS SENSORY; GAS-SENSITIVE LAYERS; IN-SITU; IN-SITU DEPOSITION; ISO-PROPANOLS; LAYER DEPOSITION; MICROWAVE PLASMA; NANOCRYSTALLINE FILMS; NANOGRANULAR LAYERS; NANOGRANULARS; NATIVE FORMS; ORDER OF MAGNITUDE; PLASMA PROCESS; PRIMARY PARTICLE SIZE; PROCESS PARAMETERS; PROTOTYPE SENSOR; SENSOR SYSTEMS; SIGNAL RESPONSE; SURFACE AREA; SURFACE HOMOGENEITY; THIN LAYERS;

CHEMICAL PROPERTIES; CHEMICAL STABILITY; GAS SENSING ELECTRODES; GASES; MECHANICAL PROPERTIES; MECHANICAL STABILITY; MICROARRAYS; MICROWAVES; NANOCRYSTALLINE SILICON; NANOPARTICLES; OXIDE FILMS; PLASMA DEPOSITION; PLASMAS; SENSORS; SILICON COMPOUNDS; SILICON OXIDES; TIN; TIN DIOXIDE;

GAS ABSORPTION;

EID: 70349419699     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200732101     Document Type: Conference Paper

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