Nanoimprint lithography using vertically aligned carbon nanostructures as stamps

Nanotechnology

Volumn 20, Issue 37, 2009, Pages

  Saleem, A M ^a   Berg, J ^a   Desmaris, V ^a   Kabir, M S ^a  

^a SMOLTEK AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOSTRUCTURES; FEATURE SIZES; HIGH ASPECT RATIO; PATTERN REPLICATION; SMALL PITCH; VERTICALLY ALIGNED;

ASPECT RATIO; NANOSTRUCTURES; PRESSURE DROP;

NANOIMPRINT LITHOGRAPHY;

CARBON NANOFIBER; NANOMATERIAL; POLYMER; CARBON;

ARTICLE; HIGH THROUGHPUT SCREENING; MEASUREMENT; NANOIMPRINT LITHOGRAPHY; NANOTECHNOLOGY; PRIORITY JOURNAL; SCANNING ELECTRON MICROSCOPY; STRUCTURE ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; CHEMISTRY; METHODOLOGY; ULTRASTRUCTURE;

CARBON; MICROSCOPY, ELECTRON, SCANNING; MICROSCOPY, ELECTRON, TRANSMISSION; NANOSTRUCTURES; NANOTECHNOLOGY;

EID: 70349093162     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/37/375302     Document Type: Article

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