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Volumn 321, Issue 23, 2009, Pages 3833-3838

Characterizations of n-type ferromagnetic GaMnN thin film grown on GaN/Al2O3 (0 0 0 1) by metal-organic chemical vapor deposition

Author keywords

Diluted magnetic semiconductor; Metal organic chemical vapor deposition; Mn doped GaN; Spintronics

Indexed keywords

COERCIVE FIELD; COMPOSITION PROFILE; CONSTANT LEVEL; CRYSTALLINITIES; DILUTED MAGNETIC SEMICONDUCTOR; DOUBLE EXCHANGE MECHANISM; EFFECTIVE MAGNETIC MOMENTS; ELECTRON CARRIER; FERROMAGNETIC HYSTERESIS LOOPS; GAN FILM; HEXAGONAL WURTZITE STRUCTURE; HIGH QUALITY; IN-DEPTH PROFILE; MAGNETIC FIELD PARALLEL; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION; MN CLUSTERS; MN-DOPED GAN; MN-DOPING; NEAR BAND EDGE EMISSIONS; OXIDATION STATE; SECONDARY PHASIS; SEMICONDUCTING BEHAVIOR; SPINTRONICS; YELLOW EMISSIONS; ZERO-FIELD-COOLED;

EID: 69949188856     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2009.05.017     Document Type: Article
Times cited : (11)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.