-
1
-
-
69549154872
-
-
U.S. Pat. 5,998, 925.
-
Y. Shimizu, K. Sakano, Y. Noguchi, and T. Moriguchi, U.S. Pat. 5,998, 925 (1999).
-
(1999)
-
-
Shimizu, Y.1
Sakano, K.2
Noguchi, Y.3
Moriguchi, T.4
-
2
-
-
18144419775
-
-
Z. Wang, H. Liang, M. Gong, and Q. Su, Electrochem. Solid-State Lett. 1099-0062, 8, H33 (2005).
-
(2005)
Electrochem. Solid-State Lett.
, vol.8
, pp. 33
-
-
Wang, Z.1
Liang, H.2
Gong, M.3
Su, Q.4
-
3
-
-
25844527156
-
-
J. K. Park, K. J. Choi, S. H. Park, C. H. Kim, and H. K. Kim, J. Electrochem. Soc. 0013-4651, 152, H121 (2005).
-
(2005)
J. Electrochem. Soc.
, vol.152
, pp. 121
-
-
Park, J.K.1
Choi, K.J.2
Park, S.H.3
Kim, C.H.4
Kim, H.K.5
-
4
-
-
34547290402
-
-
Z. Hao, J. Zhang, X. Zhang, X. Sun, Y. Luo, and S. Lu, Appl. Phys. Lett. 0003-6951, 90, 261113 (2007).
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 261113
-
-
Hao, Z.1
Zhang, J.2
Zhang, X.3
Sun, X.4
Luo, Y.5
Lu, S.6
-
5
-
-
53349141757
-
-
Y. -S. Tang, S. -F. Hu, W. -C. Ke, C. -C. Lin, Ni. C. Bagkar, and R. -S. Liu, Appl. Phys. Lett. 0003-6951, 93, 131114 (2008).
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 131114
-
-
Tang, Y.-S.1
Hu, S.-F.2
Ke, W.-C.3
Lin, C.-C.4
Bagkar, Ni.C.5
Liu, R.-S.6
-
6
-
-
69549155759
-
-
U.S. Pat. 6,682,663
-
G. H. Botty, T. Hintzen, and J. W. H. van Krevel, U.S. Pat. 6,682,663 (2004).
-
(2004)
-
-
Botty, G.H.1
Hintzen, T.2
Van Krevel, J.W.H.3
-
7
-
-
69549129794
-
-
R. -J. Xie, N. Hirosaki, T. Suehiro, F. -F. Xu, and M. Mitomo, Chem. Mater. 0897-4756, 18, 5518 (2006).
-
(2006)
Chem. Mater.
, vol.18
, pp. 5518
-
-
Xie, R.-J.1
Hirosaki, N.2
Suehiro, T.3
Xu, F.-F.4
Mitomo, M.5
-
8
-
-
3242723470
-
-
R. -J. Xie, N. Hirosaki, K. Sakuma, Y. Yamamoto, and M. Mitomo, Appl. Phys. Lett. 0003-6951, 84, 5404 (2004).
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 5404
-
-
Xie, R.-J.1
Hirosaki, N.2
Sakuma, K.3
Yamamoto, Y.4
Mitomo, M.5
-
9
-
-
20744458043
-
-
Y. Q. Li, A. C. A. Delsing, G. de With, and H. T. Hintzen, Chem. Mater. 0897-4756, 17, 3242 (2005).
-
(2005)
Chem. Mater.
, vol.17
, pp. 3242
-
-
Li, Y.Q.1
Delsing, A.C.A.2
De With, G.3
Hintzen, H.T.4
-
10
-
-
61849109203
-
-
V. Bachmann, C. Ronda, O. Oeckler, W. Schnick, and A. Meijerink, Chem. Mater. 0897-4756, 21, 316 (2009).
-
(2009)
Chem. Mater.
, vol.21
, pp. 316
-
-
Bachmann, V.1
Ronda, C.2
Oeckler, O.3
Schnick, W.4
Meijerink, A.5
-
11
-
-
0037415995
-
-
J. K. Park, M. A. Lim, C. H. Kim, H. D. Park, J. T. Park, and S. Y. Choi, Appl. Phys. Lett. 0003-6951, 82, 683 (2003).
-
(2003)
Appl. Phys. Lett.
, vol.82
, pp. 683
-
-
Park, J.K.1
Lim, M.A.2
Kim, C.H.3
Park, H.D.4
Park, J.T.5
Choi, S.Y.6
-
13
-
-
0000053255
-
-
M. F. Hazenkamp, H. U. Güdel, M. Atanasov, U. Kesper, and D. Reinen, Phys. Rev. B 0163-1829, 53, 2367 (1996).
-
(1996)
Phys. Rev. B
, vol.53
, pp. 2367
-
-
Hazenkamp, M.F.1
Güdel, H.U.2
Atanasov, M.3
Kesper, U.4
Reinen, D.5
-
14
-
-
0000369056
-
-
J. M. Evans, V. Petričević, A. B. Bykov, A. Delgado, and R. R. Alfano, Opt. Lett. 0146-9592, 22, 1171 (1997).
-
(1997)
Opt. Lett.
, vol.22
, pp. 1171
-
-
Evans, J.M.1
Petričević, V.2
Bykov, A.B.3
Delgado, A.4
Alfano, R.R.5
-
16
-
-
2942648263
-
-
Accelrys, San Diego, CA
-
M. Segall, P. Linda, M. Probert, C. Pickard, P. Hasnip, S. Clark, and M. Payne, Materials Studio CASTEP, Version 2.2, Accelrys, San Diego, CA (2002).
-
(2002)
Materials Studio CASTEP, Version 2.2
-
-
Segall, M.1
Linda, P.2
Probert, M.3
Pickard, C.4
Hasnip, P.5
Clark, S.6
Payne, M.7
-
17
-
-
0037171005
-
-
M. Segall, P. Linda, M. Probert, C. Pickard, P. Hasnip, S. Clark, and M. Payne, J. Phys.: Condens. Matter 0953-8984, 14, 2717 (2002).
-
(2002)
J. Phys.: Condens. Matter
, vol.14
, pp. 2717
-
-
Segall, M.1
Linda, P.2
Probert, M.3
Pickard, C.4
Hasnip, P.5
Clark, S.6
Payne, M.7
-
24
-
-
5544275445
-
-
0370-2693.
-
G. Blasse, Phys. Lett. 0370-2693, 28A, 444 (1968).
-
(1968)
Phys. Lett.
, vol.28
, pp. 444
-
-
Blasse, G.1
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