The threshold effect of incident exposure energy flux for photorefractive light-induced scattering in doped lithium niobate crystals

Optical Materials

Volumn 31, Issue 11, 2009, Pages 1678-1683

  Sun, Xiudong ^a   Luo, Suhua ^a   Wang, Jian ^a   Shi, Hongxin ^a   Jiang, Yongyuan ^a  

^a HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Exposure energy flux threshold; Holographic multiplexing storage; In:Fe:Cu:LiNbO3 crystals; Light induced scattering

Indexed keywords

LIGHT SCATTERING; LITHIUM; LITHIUM COMPOUNDS; NIOBIUM COMPOUNDS; PHOTOREACTIVITY; PHOTOREFRACTIVE CRYSTALS; SIGNAL TO NOISE RATIO;

DAMAGE-RESISTANT DOPANTS; EXPOSURE ENERGY; HIGH SIGNAL-TO-NOISE RATIO; HOLOGRAPHIC MULTIPLEXING; LIGHT-INDUCED SCATTERING; LINBO3 CRYSTALS; LITHIUM NIOBATE CRYSTAL; PHOTOREFRACTIVE PROPERTIES;

DOPING (ADDITIVES);

EID: 69349103609     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2009.04.006     Document Type: Article

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