Treatment of local scrubber wastewater for semiconductor by using photo-catalytic ozonation

Water Science and Technology

Volumn 59, Issue 11, 2009, Pages 2281-2286

  Chou, Chung Yi ^a   Huang, Chien Pin ^a   Shang, Neng Chou ^b   Yu, Yue Hwa ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL ILAN UNIVERSITY   (Taiwan)

Author keywords

Advanced oxidation processes (AOPS); Al2O3 and TiO2 Al2O3; Local scrubber wastewater (LSW); Semiconductor; Technology for water reclamation

Indexed keywords

ADVANCED OXIDATION PROCESS; LOCAL SCRUBBER; LOCAL SCRUBBER WASTEWATER (LSW); SEMICONDUCTOR TECHNOLOGY; TIO; WATER RECLAMATION;

ALUMINUM; CATALYTIC OXIDATION; CHEMICAL OXYGEN DEMAND; ION EXCHANGE; IONS; OXIDATION RESISTANCE; OZONE; OZONE WATER TREATMENT; OZONIZATION; REMOVAL; SCRUBBERS; WASTEWATER; WASTEWATER TREATMENT; WATER RECYCLING;

WASTEWATER RECLAMATION;

ALUMINUM OXIDE; BUFFER; OZONE; TIN OXIDE; TITANIUM; TITANIUM DIOXIDE;

ALKALINITY; ALUMINUM OXIDE; BUFFERING; CATALYSIS; ION EXCHANGE; OXIDATION; OZONE; PHOTODEGRADATION; POLLUTANT REMOVAL; SEMICONDUCTOR INDUSTRY; TITANIUM; TOTAL ORGANIC CARBON; ULTRAVIOLET RADIATION; WASTEWATER; WATER TREATMENT;

ACIDITY; ALKALINITY; ARTICLE; CATALYST; CONTROLLED STUDY; ION EXCHANGE; OZONATION; PHOTOCATALYSIS; SCRUBBER; SEMICONDUCTOR; TOTAL ORGANIC CARBON; ULTRAVIOLET RADIATION; WASTE COMPONENT REMOVAL; WASTE WATER MANAGEMENT; CATALYSIS; CHEMISTRY; METHODOLOGY; OXIDATION REDUCTION REACTION; PH; PHOTOCHEMISTRY; SEWAGE; WATER MANAGEMENT;

ALUMINUM OXIDE; CATALYSIS; HYDROGEN-ION CONCENTRATION; OXIDATION-REDUCTION; OZONE; PHOTOCHEMISTRY; SEMICONDUCTORS; TITANIUM; WASTE DISPOSAL, FLUID; WATER PURIFICATION;

EID: 69249235489     PISSN: 02731223     EISSN: None     Source Type: Journal    
DOI: 10.2166/wst.2009.274     Document Type: Article

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