Effect of N, C and B interstitial atoms on local bonding structure in mechanically activated TiH2/h-BN, TiH2/C, and TiH2/B mixtures

Journal of Alloys and Compounds

Volumn 483, Issue 1-2, 2009, Pages 309-312

  Morozova, O S ^a   Khomenko, T I ^a   Borchers, Ch ^b   Leonov, A V ^c   Kurmaev, E Z ^d   Moewes, A ^e  

^a SEMENOV INSTITUTE OF CHEMICAL PHYSICS   (Russian Federation)

^b UNIVERSITY OF GÖTTINGEN   (Germany)

^c MOSCOW STATE UNIVERSITY   (Russian Federation)

^d INSTITUTE OF METAL PHYSICS   (Russian Federation)

^e UNIVERSITY OF SASKATCHEWAN   (Canada)

Author keywords

Reactive milling in He flow (B); Temperature programmed desorption (D); TiH2 h BN, TiH2 C, and TiH2 B nanocomposites (A); Transmission electron microscopy (D); X ray diffraction (D); X ray emission spectroscopy (D)

Indexed keywords

ADDITIVE MATRIX; B ATOMS; CHEMICAL BONDINGS; INTERSTITIAL ATOMS; LOCAL BONDING; REACTIVE MILLING IN HE FLOW (B); THERMAL STABILITY; TI ATOMS; TIH2/H-BN, TIH2/C, AND TIH2/B NANOCOMPOSITES (A); X RAY EMISSION SPECTROSCOPY; X-RAY DIFFRACTION (D); X-RAY EMISSION SPECTROSCOPY (D);

ADDITIVES; ATOMS; BALL MILLING; BORON; BORON NITRIDE; CHEMICAL BONDS; DIFFRACTION; ELECTROMAGNETIC WAVE EMISSION; ELECTRON MICROSCOPES; EMISSION SPECTROSCOPY; HELIUM; HYDROGEN; ION BEAMS; LIGHT TRANSMISSION; MILLING (MACHINING); NANOCOMPOSITES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING; X RAYS;

TEMPERATURE PROGRAMMED DESORPTION;

EID: 69249229661     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.08.093     Document Type: Article

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