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Journal of the Korean Physical Society

Volumn 55, Issue 1, 2009, Pages 129-133

Electronic structure of the NiOx film fabricated by using a thermal oxidation technique

(5) Seo, Y K a Lee, D J a Lee, Y S a Choi, W S b Kim, D W c

a Soongsil University (South Korea)

b Seoul National University (South Korea)

c Ewha Womans University (South Korea)

Author keywords

Electronic structure; NiO; Optical spectroscopy; ReRAM

Indexed keywords

EID: 69249187752 PISSN: 03744884 EISSN: None Source Type: Journal
DOI: 10.3938/jkps.55.129 Document Type: Article

Times cited : (8)

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