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Volumn 54, Issue 8, 2009, Pages 367-369
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Twinning as a possible mechanism of stress relaxation accompanying the formation of refractory crystalline oxides: Polycrystalline ceramics and single crystals
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Author keywords
[No Author keywords available]
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Indexed keywords
COMPUTER PROGRAM;
CORRUGATED SURFACES;
CRYSTALLINE OXIDES;
GROWTH DIRECTIONS;
INDUCED STRESS;
INVERSION CENTER;
POLYCRYSTALLINE CERAMICS;
WORK PIECES;
X-RAY DIFFRACTION DATA;
CRYSTAL IMPURITIES;
CRYSTALLINE MATERIALS;
GARNETS;
REFRACTORY MATERIALS;
RESIDUAL STRESSES;
SILICATE MINERALS;
STRESS RELAXATION;
STRESS RELIEF;
TWINNING;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
SINGLE CRYSTALS;
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EID: 69249157194
PISSN: 10283358
EISSN: None
Source Type: Journal
DOI: 10.1134/S1028335809080047 Document Type: Article |
Times cited : (2)
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References (8)
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