Treatment of printed circuit board industrial wastewater by Ferrite process combined with Fenton method

Journal of Hazardous Materials

Volumn 170, Issue 2-3, 2009, Pages 620-626

  Lou, Jie Chung ^a   Huang, Yu Jen ^a   Han, Jia Yun ^a  

^a NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

Author keywords

Fenton method; Ferrite process; Wastewater

Indexed keywords

ANALYTICAL RESULTS; EFFLUENT WATERS; FENTON METHOD; FENTON OXIDATION; FERRITE PROCESS; INDUSTRIAL WASTEWATERS; MOLAR RATIO; OPTIMUM PARAMETERS; ORGANICS; PH LEVELS; SEM/EDS; SEQUENTIAL PROCEDURES; TOTAL DOSE; TOXICITY CHARACTERISTIC LEACHING PROCEDURES; UNTREATED WASTEWATER;

BIOCHEMICAL OXYGEN DEMAND; EFFLUENT TREATMENT; EFFLUENTS; FERRITE; INDUSTRIAL WATER TREATMENT; LEACHING; METAL IONS; PRINTED CIRCUIT BOARDS; PRINTED CIRCUIT MANUFACTURE; SATURATION MAGNETIZATION; TRACE ANALYSIS; WASTEWATER; WATER RECYCLING;

WASTEWATER TREATMENT;

FERRITE; HYDROGEN PEROXIDE; METAL ION; ORGANIC MATTER;

ANALYTICAL METHOD; FEASIBILITY STUDY; INDUSTRIAL WASTE; LEACHING; OXIDATION; PARTICLE SIZE; SLUDGE; TESTING METHOD; WASTE TREATMENT;

ARTICLE; CHEMICAL OXYGEN DEMAND; CONTROLLED STUDY; EFFLUENT STANDARD; FENTON REACTION; LEACHING; METAL RECOVERY; PARTICLE SIZE; PH; PROCESS OPTIMIZATION; SCANNING ELECTRON MICROSCOPY; SLUDGE TREATMENT; TAIWAN; WASTE WATER MANAGEMENT; WASTE WATER RECYCLING; WATER STANDARD;

ALGORITHMS; CARBON; FERRIC COMPOUNDS; HYDROGEN PEROXIDE; HYDROGEN-ION CONCENTRATION; INDUSTRIAL WASTE; IRON; METALS; MICROSCOPY, ELECTRON, SCANNING; OXIDATION-REDUCTION; OXYGEN; REFERENCE STANDARDS; SEMICONDUCTORS; TAIWAN; WASTE DISPOSAL, FLUID; WATER POLLUTANTS, CHEMICAL; X-RAY DIFFRACTION;

EID: 69049106384     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2009.05.020     Document Type: Article

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