In Situ x-ray probes for piezoelectricity in epitaxial ferroelectric capacitors

Integrated Ferroelectrics

Volumn 101, Issue 1, 2008, Pages 174-181

  Do, Dal Hyun ^a   Grigoriev, Alexei ^a   Kim, Dong Min ^a   Eom, Chang Beom ^a   Evans, Paul G ^a   Dufresne, Eric M ^b  

^a University of Wisconsin Madison   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Ferroelectric thin films; Piezoelectricity; X ray diffraction; X ray microscopy

Indexed keywords

COERCIVE ELECTRIC FIELD; ELECTRICAL CONTACTS; EPITAXIAL FERROELECTRIC; EPITAXIAL THIN FILMS; FERROELECTRIC CAPACITORS; FERROELECTRIC PROPERTY; IN-SITU; MECHANICAL RESONANCE; MICRODIFFRACTIONS; PB(ZR , TI)O3; PIEZOELECTRIC COEFFICIENT; PROBE STRUCTURES; QUANTITATIVE AGREEMENT; SPATIAL RESOLUTION; STRUCTURAL SPECIFICITY; SYNCHROTRON X RAYS; TIME-RESOLVED; X RAY MICROSCOPY;

CAPACITANCE; CAPACITORS; CRYSTALLOGRAPHY; DIFFRACTION; ELECTRIC FIELDS; EPITAXIAL FILMS; FERROELECTRIC DEVICES; FERROELECTRIC FILMS; FERROELECTRIC THIN FILMS; FERROELECTRICITY; IMAGE RESOLUTION; INTERCONNECTION NETWORKS; LEAD; PIEZOELECTRIC DEVICES; PROBES; THIN FILM DEVICES; X RAY DIFFRACTION; X RAY MICROSCOPES; X RAYS; ZIRCONIUM;

PIEZOELECTRICITY;

EID: 68949189757     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584580802470975     Document Type: Conference Paper

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