Nanogap array fabrication using doubly clamped freestanding silicon nanowires and angle evaporations

ETRI Journal

Volumn 31, Issue 4, 2009, Pages 351-356

  Yu, Han Young ^a   Ah, Chil Seong ^a   Baek, In Bok ^a   Kim, Ansoon ^a   Yang, Jong Heon ^a   Ahn, Chang Guen ^a   Park, Chan Woo ^a   Kim, Byung Hoon ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

Angle evaporation; Freestanding nanowires; Nanogap

Indexed keywords

ANGLE EVAPORATION; ARRAY FABRICATION; AU NANOPARTICLE; DNA HYBRIDIZATION; FREESTANDING NANOWIRES; GAP DISTANCES; NANOGAP; SEMICONDUCTOR PROCESS; SI NANOWIRE; SILICON DIOXIDE; SILICON NANOWIRES; SINGLE ELECTRON TRANSISTORS;

ELECTRIC WIRE; EVAPORATION; GOLD; MOLECULAR ELECTRONICS; NUCLEIC ACIDS; SEMICONDUCTING SILICON; SILICA; VAPORS;

NANOWIRES;

EID: 68949131507     PISSN: 12256463     EISSN: None     Source Type: Journal    
DOI: 10.4218/etrij.09.0109.0006     Document Type: Article

References (15)

1. J. Shendure et al., "Advanced Sequencing Technologies: Methods and Goals", Nature Reviews Genetics, vol. 5, no. 5, 2004, pp. 335-344.
2. E.Y. Chan, "Advances in Sequencing Technology", Mutation Research-Fundamental and Molecular Mechanisms of Mutagenesis, vol. 573, no. 1-2, 2005, pp. 13-40.
3. L.J. Kricka et al., "Miniaturized Detection Technology in Molecular Diagnostics", Expert Review of Molecular Diagnostics, vol. 5, no. 4, July 2005, pp. 549-595.
4. Y.S. Kim et al., "Miniaturized Electronic Nose System Based on Personal Digital Assistant", ETRI Journal, vol. 27, no. 5, Oct. 2005, pp. 585-594.
5. P.B. Fischer and S.Y. Chou, "10 nm Electron Beam Lithography and Sub-50 nm Overlay Using a Modified Scanning Electron Microscope", Appl. Phys. Lett., vol. 62, no. 23, 1993, pp. 2989-2991.
6. S. Itousa et al., "Fabrication and AFM Characterization of a Coplanar Tunnel Junction with a Less Than 30 nm Interelectrode Gap", Nanotechnology, vol. 5, 1994, pp. 19-25.
7. H. Park et al., "Fabrication of Metallic Electrodes with Nanometer Separation by Electromigration", Appl. Phys. Lett., vol. 75, no. 2, July 1999, pp. 301-303.
8. M.A. Reed et al., "Conductance of a Molecular Junction", Science, vol. 278, no. 5336, Oct. 1997, pp. 252-254.
9. 3 as a Sacrificial Layer", Nanotechnology, vol. 16, 2005, pp. 361-364.
10. C.S. Ah et al., "Fabrication of Integrated Nanogap Electrodes by Surface-Catalyzed Chemical Deposition", Appl. Phys. Lett, vol. 88, 2006, pp. 133116-1-113116-3.
11. J. Kim et al., "Integration of 5-V CMOS and High-Voltage Devices for Display Drive Applications", ETRI Journal, vol. 20, no. 1, 1998, pp. 37-45.
12. J. Storhoff et al., "One-Pot Colorimetric Differentiation of Polynucleotides with Single Base Imperfections Using Gold Nanoparticle Probes", J. Am. Chem. Soc., vol. 120, no. 9, 1998, pp. 1959-1964.
13. X. Liang and S.Y. Chou, "Nanogap Detector inside Nanofluidic Channel for Fast Real-Time Label-Free DNA Analysis", Nano Letters, vol. 8, no. 5, Apr. 2008, pp. 1472-1476.
14. H. Grabert and M.H. Devoret, Single Charge Tunneling, New York: Plenum, 1992.
15. F. Ruffino et al., "Size-Dependent Schottky Barrier Height in Self-Assembled Gold Nanoparticles", Appl. Phys. Lett., vol. 89, no. 24, 2006, pp. 243113-1-243113-3.