Electron affinity of arsenic and the fine structure of As- measured using infrared photodetachment threshold spectroscopy

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 80, Issue 1, 2009, Pages

  Walter, C W ^a   Gibson, N D ^a   Field, R L ^a   Snedden, A P ^a   Shapiro, J Z ^a   Janczak, C M ^a   Hanstorp, D ^b  

^a DENISON UNIVERSITY   (United States)

^b UNIVERSITY OF GOTHENBURG   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CROSS SECTION; EXCITED LEVELS; FINE STRUCTURES; NEUTRAL ATOMS; PHOTODETACHMENT THRESHOLDS; PHOTON ENERGY RANGE; PRESENT VALUE; SPLITTINGS;

ARSENIC; BINDING ENERGY; ELECTRON AFFINITY; GROUND STATE; SHEAR WAVES; UNCERTAINTY ANALYSIS;

INFRARED SPECTROSCOPY;

EID: 68549104307     PISSN: 10502947     EISSN: 10941622     Source Type: Journal    
DOI: 10.1103/PhysRevA.80.014501     Document Type: Article

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