An investigation about the limitation of strained-Si technology

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 2009, Pages 28-29

  Liao, M H ^a   Yeh, Lingyen ^a   Lu, J C ^a   Yu, M H ^a   Wang, L T ^a   Wu, J ^a   Jeng, P R ^a   Lee, T L ^a   Jang, Simon ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 68349159734     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2009.5159277     Document Type: Conference Paper

References (5)

1. F. Payet, et al., TED, p. 105, 2008.
2. M. H. Liao., et al. EDL, p. 402, 2008.
3. M. H. Liao., et al. APL, p. 063506, 2008.
4. O. Bonno., et al., VLSI, p. 134, 2007.
5. A. Cros., et al. IEDM, 2007.