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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 4, 2009, Pages 1915-1918

Enhanced resolution of poly(methyl methacrylate) electron resist by thermal processing

(3) Arjmandi, Nima a Lagae, Liesbet a Borghs, Gustaaf a

a IMEC (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; AMORPHOUS THIN FILMS; DEVELOPMENT PROCESS; ELECTRON BEAM RESIST; ELECTRON RESIST; ETCH RESISTANCE; GRANULAR NANOSTRUCTURES; HIGH TEMPERATURE; LINE EDGE ROUGHNESS; METAL THIN FILM; NOVEL PROCESS; PATTERNED ARRAYS; POLY(METHYL METHACRYLATE); RESIST PATTERN; THERMAL PROCESS; THERMAL PROCESSINGS;

AMORPHOUS FILMS; ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON EMISSION; ESTERS; PHOTORESISTS; SURFACE ROUGHNESS; THIN FILM DEVICES; THIN FILMS;

ELECTRONS;

EID: 68349151095 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.3167367 Document Type: Article

Times cited : (23)

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