Chemical durability of metallic copper nanoparticles in silica thin films synthesized by sol-gel

Journal of Physics D: Applied Physics

Volumn 41, Issue 23, 2008, Pages

  Akhavan, O ^a  

^a SHARIF UNIVERSITY OF TECHNOLOGY   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL DURABILITY; COPPER CONCENTRATION; CU NANOPARTICLES; CUPRIC OXIDE; FILM SURFACES; HIGH TEMPERATURE; METALLIC COPPER; METALLIC CU NANOPARTICLES; OPTICAL ABSORPTION SPECTRUM; OXIDIZED FILMS; PRESENCE OF WATER; REDUCING ENVIRONMENT; REDUCING TEMPERATURE; REDUCTION PROCESS; SILICA FILM; SILICA MATRIX; SILICA THIN FILMS; SOL-GEL SILICA; SURFACE PLASMON RESONANCE ABSORPTION; TIME EVOLUTIONS;

ABSORPTION; COPPER METALLURGY; COPPER OXIDES; CRYSTALLINE MATERIALS; DURABILITY; GELATION; GELS; LIGHT ABSORPTION; NANOPARTICLES; OXIDE FILMS; SILICA; SOL-GEL PROCESS; SOL-GELS; SOLS; SURFACE PLASMON RESONANCE; THIN FILMS; WATER CONTENT;

COPPER;

EID: 68349141310     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/23/235407     Document Type: Article

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