Electrodeposition and corrosion behaviour of some Zn-Fe group metal alloys by pulsed current

Transactions of the Institute of Metal Finishing

Volumn 87, Issue 4, 2009, Pages 208-216

  Thangaraj, V ^a  

^a MANIPAL INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Corrosion; Cyclic voltammetry; Pulse current; Sem; Zn Fe group alloys

Indexed keywords

ALLOY DEPOSITS; AVERAGE CURRENT DENSITIES; CHEMICAL COMPOSITIONS; CHLORIDE BATHS; CORROSION BEHAVIOUR; CORROSION PERFORMANCE; DIRECT CURRENT; DUTY CYCLES; ELECTROCHEMICAL BEHAVIOUR; ELECTROCHEMICAL TEST; GRAIN SIZE; GROUP METAL ALLOYS; OFF TIME; ON TIME; OPTIMAL CONDITIONS; PULSE CURRENT; PULSE DUTY CYCLE; PULSE FREQUENCIES; PULSE PARAMETER; PULSE PLATING; PULSED CURRENTS; SEM; ZN-FE GROUP ALLOYS;

ALLOYS; CHLORINE COMPOUNDS; CORROSION RATE; CORROSION RESISTANCE; DEPOSITS; ELECTROPLATING; IRON ALLOYS; METALS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; ZINC;

CYCLIC VOLTAMMETRY;

EID: 68249153542     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1179/174591909X424816     Document Type: Article

References (28)

1. A. Brenner: 'Electrodeposition of alloys', Vol. 2; 1963, New York and London, Academic Press.
2. L. Domnikov: Met. Finish., 1966, 64, 68.
3. T. Akiyama and H. Fukushima: ISIJ Int., 1992, 32, 787.
4. S. S. Abd El Rehim, E. E. Fouad, S. M. Abd El Wahab and H. H. Hassan: Electrochim. Acta, 1996, 41, (9), 1413.
5. H. S. Kim, B. N. Popov and K. S. Chen: Corros. Sci., 2003, 45, 1505.
6. K. M. S. Youssef, C. C. Koch and P. S. Fedkiw: J. Electrochem. Soc., 2004, 151, (2), C103.
7. I. H. Karahan, H. A. Cetinkara and H. S. Guder: Trans. IMF, 2008, 86, (3), 157-161
8. M. Halmdienst, W. E. G. Hansal, G. Kaltenhauser and W. Kautek: Trans. IMF, 2007, 85, (1), 22-27
9. J. M. Yang, D. Zhu and D. H. Kim: Trans. IMF, 2008, 86, (2), 98-102
10. R. Ramanauskas, L. Gudaviciute, A. Kalinicenko and R. Juskenas: Chemija, 2004, 15, 22.
11. C. Wan, H. Y. Cheh and H. B. Linford: Plating, 1974, 61, 559.
12. Y. Fukumoto, Y. Kawashiman and T. Hayashi: Plat. Surf. Finish., 1986, 73, 62.
13. R. Ramanauskas, L. Gudaviciute, O. Scit, D. Bucinskiene and R. Juskenas: Trans. IMF, 2008, 86, (2), 103-108
14. M. Alfantazi, J. Page and U. Erb: J. Appl. Ekctrochem., 1996, 26, 1225.
15. M. Alfantazi, G. Brehaut and U. Erb: Surf. Coat. Technol., 1997, 89, 239.
16. Y. F. Jiang, L. F. Liu, C. Q. Zhai, Y. P. Zhu and W. J. Ding: Thin Solid Films, 2005, 484, 232.
17. Y. F. Jiang, L. F. Liu, C. Q. Zhai, Y. P. Zhu and W. J. Ding: Surf. Coat. Technol., 2005, 191, 393.
18. J. B. Bajat, M. D. Maksimovic and G. R. Radovic: J. Serb. Chem. Soc., 2002, 678, 625.
19. H. Ashassi-Sorkhabi, A. Hagrah, N. Parvini-Ahmadi and J. Manzoori: Surf. Coat. Technol., 2001, 140, 278.
20. T. E. Sharpies: Prod. Finish., 1990, 54, 1088.
21. S. Lichusina, A. Sudavicius, R. Juskenas, D. Bucinskiene and E. Juzeliunas: Trans. IMF, 2008, 86, (3), 141-147
22. N. R. Short, A. Abibsi and J. K. Dennis: Trans IMF, 1989, 67, 73.
23. M. E. Bahrololoom, D. R. Gabe and G. D. Wilcox: J. Electrochem. Soc., 2003, 150, C144.
24. J. Y. Fei and G. D. Wilcox: Electrochim. Acta, 2005, 50, 2693.
25. R. Tomachuk, C. M. de A. Freire, M. Ballester, R. Fratesi and G. Roventi: Surf. Coat. Technol., 1999, 122, 6.
26. F. Y. Ge, S. K. Xu, S. B. Yao and S. M. Shou: Surf. Coat. Technol., 1996, 88, 4.
27. V. A. Knodler, C. J. Raub and E. Raub: Metalloberflacho, 1985, 39, 21.
28. M. El. Azhar, B. Mernari, M. Traisnel, F. Bentiss and M. Lagrenee: Corros. Sci., 2001, 43, 2229.