High-pressure growth of fluorine-free SmFeAsO1-x superconducting single crystals

Superconductor Science and Technology

Volumn 22, Issue 7, 2009, Pages

  Lee, H S ^a   Park, J H ^a   Lee, J Y ^a   Kim, J Y ^b   Sung, N H ^b   Koo, T Y ^c   Cho, B K ^b   Jung, C U ^d   Saini, S ^e   Kim, S J ^e   Lee, H J ^a,f  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

^c POSTECH   (South Korea)

^d Hankuk University of Foreign Studies   (South Korea)

^e Jeju National University   (South Korea)

^f National Center for Nanomaterials Technology (NCNT)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE-FREE; HIGH QUALITY; HIGH RESOLUTION; IMPURITY PHASIS; LATERAL SIZES; MAGNETIC FIELD DEPENDENCES; NOMINAL COMPOSITION; PRESSURE GROWTH; RESIDUAL RESISTIVITY; RESIDUAL RESISTIVITY RATIOS; RESISTIVE TRANSITION; SELF-FLUX METHODS; SHARP TRANSITION; SUPERCONDUCTING TRANSITIONS; X RAY DIFFRACTOMETRY;

CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; FLUORINE; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MAGNETIC FIELDS; ORGANIC POLYMERS; SCANNING; SCANNING ELECTRON MICROSCOPY; SUPERCONDUCTIVITY;

SINGLE CRYSTALS;

EID: 68149124663     PISSN: 09532048     EISSN: 13616668     Source Type: Journal    
DOI: 10.1088/0953-2048/22/7/075023     Document Type: Article

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