Property of highly oriented SrAl2 O4:Eu film on quartz glass substrates and its potential application in stress sensor

Journal of the Electrochemical Society

Volumn 156, Issue 9, 2009, Pages

  Fu, Xiaoyan ^a   Yamada, Hiroshi ^a   Xu, Chao Nan ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; CRYSTALLINITIES; FILM SURFACES; HIGH SENSITIVITY; IR SPECTROSCOPY; MECHANICAL STIMULUS; MECHANICAL STRESS; MECHANOLUMINESCENCE; POTENTIAL APPLICATIONS; QUARTZ GLASS SUBSTRATES; RADIO-FREQUENCY-MAGNETRON SPUTTERING; STRESS SENSOR; XRD;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; EUROPIUM; GLASS; OXIDE MINERALS; QUARTZ; SCANNING ELECTRON MICROSCOPY; STRESSES; TRIBOLUMINESCENCE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

SUBSTRATES;

EID: 68049124578     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3156652     Document Type: Article

References (25)

1. Y. Liu and C. N. Xu, J. Phys. Chem. B 1089-5647, 107, 3991 (2003). 10.1021/jp022062c
2. W. Jia, H. Yuan, and L. Lu, J. Cryst. Growth 0022-0248, 200, 179 (1999). 10.1016/S0022-0248(98)01099-9
3. A. J. Walton, Adv. Phys. 0001-8732, 26, 887 (1977). 10.1080/ 00018737700101483
4. C. N. Xu, in Encyclopedia of Smart Materials, M. Schwartz, Editor, Vol. 1, p. 190, John Wiley & Sons, New York (2002).
5. C. N. Xu, H. Yamada, X. S. Wang, and X. G. Zheng, Appl. Phys. Lett. 0003-6951, 84, 3040 (2004). 10.1063/1.1705716
6. I. Sage, R. Badcock, L. Humberstone, N. Geddes, M. Kemp, and G. Bourhill, Smart Mater. Struct. 0964-1726, 8, 504 (1999). 10.1088/0964-1726/8/4/308
7. C. N. Xu, T. Wantanabe, M. Akiyama, and X. G. Zheng, Appl. Phys. Lett. 0003-6951, 74, 1236 (1999). 10.1063/1.123510
8. H. Zhang, H. Yamada, N. Terasaki, and C. N. Xu, J. Electrochem. Soc. 0013-4651, 155, J128 (2008). 10.1149/1.2890856
9. C. N. Xu, T. Wantanabe, M. Akiyama, and X. G. Zheng, Appl. Phys. Lett. 0003-6951, 74, 2414 (1999). 10.1063/1.123865
10. J. S. Kim, Y. N. Kwon, N. Shin, and K. S. Sohn, Appl. Phys. Lett. 0003-6951, 90, 241916 (2007). 10.1063/1.2748100
11. K. S. Sohn, D. H. Park, and J. S. Kim, J. Electrochem. Soc. 0013-4651, 152, H161 (2005). 10.1149/1.2012947
12. H. Suematsu, M. Sengiku, K. Kato, M. Mitome, K. Kimoto, Y. Matsui, W. Jiang, and K. Yatsui, Thin Solid Films 0040-6090, 407, 136 (2002). 10.1016/S0040-6090(02)00027-5
13. K. Sato, S. Komuro, T. Morikawa, H. Aizawa, T. Katsumata, S. Harako, and X. Zhao, J. Cryst. Growth 0022-0248, 275, e1137 (2005). 10.1016/j.jcrysgro.2004. 11.203
14. D. Wang, Y. X. Li, and Y. H. Xiong, J. Electrochem. Soc. 0013-4651, 152, H12 (2005). 10.1149/1.1833317
15. K. Kato, I. Tsutai, T. Kamimura, F. Kaneko, K. Shinbo, M. Ohta, and T. Kawakami, J. Lumin. 0022-2313, 82, 213 (1999). 10.1016/S0022-2313(99)00036-8
16. X. Y. Fu, H. Yamada, and C. N. Xu, Electrochem. Solid-State Lett. 1099-0062, 11, J27 (2008). 10.1149/1.2844132
17. X. Y. Fu, H. Yamada, K. Nishikubo, H. W. Zhang, and C. N. Xu, J. Cryst. Growth 0022-0248, 310, 2885 (2008). 10.1016/j.jcrysgro.2008.01.046
18. A. Nag and T. R. N. Kutty, Mater. Res. Bull. 0025-5408, 39, 331 (2004). 10.1016/j.materresbull.2003.11.007
19. D. Jia, X. J. Wang, E. V. D. Kolk, and W. M. Yen, Opt. Commun. 0030-4018, 204, 247 (2002). 10.1016/S0030-4018(02)01300-7
20. H. Matsui, C. N. Xu, Y. Liu, and H. Tateyama, Phys. Rev. B 0163-1829, 69, 235109 (2004). 10.1103/PhysRevB.69.235109
21. J. R. Hird, A. Chakravarty, and A. J. Walton, J. Phys. D: Appl. Phys. 0022-3727, 40, 1464 (2007). 10.1088/0022-3727/40/5/023
22. W. Hoogenstraaten, Philips Res. Rep., 13, 515 (1958).
23. H. Yamada, X. Y. Fu, and C. N. Xu, J. Electrochem. Soc. 0013-4651, 154, J348 (2007). 10.1149/1.2772194
24. X. Wang, C. N. Xu, H. Yamada, K. Nishikubo, and X. G. Zheng, Adv. Mater. (Weinheim, Ger.) 0935-9648, 1254, 17 (2005).
25. Y. Liu and C. N. Xu, Appl. Phys. Lett. 0003-6951, 84, 5016 (2004). 10.1063/1.1763223