Employment of a metal microgrid as a front electrode in a sandwich-structured photodetector

Applied Optics

Volumn 48, Issue 19, 2009, Pages 3638-3642

  Zhang, Junying ^a   Cai, Chao ^a   Pan, Feng ^a   Hao, Weichang ^a   Zhang, Weiwei ^a   Wang, Tianmin ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; IRRADIATION; PHOTONS;

IRRADIATION INTENSITY; METAL ELECTRODES; MICRO GRID; SEMICONDUCTOR FILMS; SEMICONDUCTOR LAYERS; TRANSPARENT METALS; ULTRA-VIOLET; UV-LIGHT IRRADIATION;

PHOTODETECTORS;

EID: 67749135489     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.48.003638     Document Type: Article

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