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Journal of Modern Optics

Volumn 56, Issue 9, 2009, Pages 1133-1136

Fabrication of three-dimensional photonic crystals by interference lithography with low light absorption

(4) Miklyaev, Yu V a Karpeev, S V b Dyachenko, P N b Pavelyev, V S b

a SOUTH URAL STATE UNIVERSITY (Russian Federation)

b RUSSIAN ACADEMY OF SCIENCES (Russian Federation)

Author keywords

He Cd laser; Interference lithography; Photonic crystal; Photoresist SU 8

Indexed keywords

ABSORPTION BAND; HE-CD LASER; HE-CD LASERS; INTERFERENCE LITHOGRAPHY; ORTHORHOMBIC LATTICES; POLYMER TEMPLATES; POROUS STRUCTURES; SU-8 PHOTORESIST; THREE DIMENSIONAL PHOTONIC CRYSTALS;

ABSORPTION; CRYSTAL ATOMIC STRUCTURE; HELIUM; LASERS; LIGHT ABSORPTION; LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; SILICON ON INSULATOR TECHNOLOGY; SURFACE TREATMENT;

PHOTONIC CRYSTALS;

EID: 67651202196 PISSN: 09500340 EISSN: 13623044 Source Type: Journal
DOI: 10.1080/09500340902919469 Document Type: Article

Times cited : (15)

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