Materials for optical lithography tool application

Annual Review of Materials Research

Volumn 39, Issue , 2009, Pages 127-153

  Sewell, Harry ^a   Mulkens, Jan ^b  

^a HLS Lithography Consulting   (United States)

^b ASML   (Netherlands)

Author keywords

Discharge produced plasma; EUV sources; High index; Immersion; Laser produced plasma; Lens materials; Lithium; Tin; Xenon

Indexed keywords

DISCHARGE-PRODUCED PLASMA; EUV SOURCES; HIGH INDEX; IMMERSION; LENS MATERIALS;

ELECTRIC DISCHARGES; EXTREME ULTRAVIOLET LITHOGRAPHY; LASER PRODUCED PLASMAS; LENSES; LIGHT SOURCES; LITHIUM; OPTICAL INSTRUMENTS; TIN; ULTRAVIOLET DEVICES; XENON;

MATERIALS;

EID: 67650960943     PISSN: 15317331     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev-matsci-082908-145309     Document Type: Review

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