-
1
-
-
0348163681
-
-
0022-3778,. 10.1017/S0022377801001350
-
H. S. Uhm, E. H. Choi, G. Cho, and K. Whang, J. Plasma Phys. 0022-3778 67, 49 (2002). 10.1017/S0022377801001350
-
(2002)
J. Plasma Phys.
, vol.67
, pp. 49
-
-
Uhm, H.S.1
Choi, E.H.2
Cho, G.3
Whang, K.4
-
3
-
-
0346991660
-
-
0022-3727,. 10.1088/0022-3727/36/23/019
-
Z. Fang, Y. Qiu, and Y. Luo, J. Phys. D: Appl. Phys. 0022-3727 36, 2980 (2003). 10.1088/0022-3727/36/23/019
-
(2003)
J. Phys. D: Appl. Phys.
, vol.36
, pp. 2980
-
-
Fang, Z.1
Qiu, Y.2
Luo, Y.3
-
4
-
-
36449003605
-
-
0021-8979,. 10.1063/1.348830
-
S. K. Dhali and I. Sardja, J. Appl. Phys. 0021-8979 69, 6319 (1991). 10.1063/1.348830
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 6319
-
-
Dhali, S.K.1
Sardja, I.2
-
5
-
-
20844443631
-
-
0003-6951,. 10.1063/1.1906299
-
L. F. Dong, J. X. Ran, and Z. G. Mao, Appl. Phys. Lett. 0003-6951 86, 161501 (2005). 10.1063/1.1906299
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 161501
-
-
Dong, L.F.1
Ran, J.X.2
Mao, Z.G.3
-
6
-
-
43249100374
-
-
0963-0252,. 10.1088/0963-0252/17/1/015015
-
L. F. Dong, Y. Y. Qi, Z. C. Zhao, and Y. H. Li, Plasma Sources Sci. Technol. 0963-0252 17, 015015 (2008). 10.1088/0963-0252/17/1/015015
-
(2008)
Plasma Sources Sci. Technol.
, vol.17
, pp. 015015
-
-
Dong, L.F.1
Qi, Y.Y.2
Zhao, Z.C.3
Li, Y.H.4
-
7
-
-
34247539523
-
-
0963-0252,. 10.1088/0963-0252/16/2/002
-
N. Balcon, A. Aanesland, and R. Boswell, Plasma Sources Sci. Technol. 0963-0252 16, 217 (2007). 10.1088/0963-0252/16/2/002
-
(2007)
Plasma Sources Sci. Technol.
, vol.16
, pp. 217
-
-
Balcon, N.1
Aanesland, A.2
Boswell, R.3
-
8
-
-
0001230757
-
-
0953-4075,. 10.1088/0953-4075/29/17/014
-
S. Pellerin, K. Musiol, B. Pokrzywka, and J. Chapelle, J. Phys. B 0953-4075 29, 3911 (1996). 10.1088/0953-4075/29/17/014
-
(1996)
J. Phys. B
, vol.29
, pp. 3911
-
-
Pellerin, S.1
Musiol, K.2
Pokrzywka, B.3
Chapelle, J.4
-
9
-
-
0004056077
-
-
(McGraw-Hill, New York),.
-
H. R. Griem, Plasma Spectroscopy (McGraw-Hill, New York, 1964), p. 492.
-
(1964)
Plasma Spectroscopy
, pp. 492
-
-
Griem, H.R.1
-
10
-
-
0035331651
-
-
0963-0252,. 10.1088/0963-0252/10/2/325
-
R. Konjevic, Plasma Sources Sci. Technol. 0963-0252 10, 356 (2001). 10.1088/0963-0252/10/2/325
-
(2001)
Plasma Sources Sci. Technol.
, vol.10
, pp. 356
-
-
Konjevic, R.1
-
11
-
-
2142772665
-
-
0022-4073,. 10.1016/j.jqsrt.2003.08.007
-
D. Nikolić, S. Djurović, Z. Mijatović, R. Kobilarov, B. Vujičić, and M. irišan, J. Quant. Spectrosc. Radiat. Transf. 0022-4073 86, 285 (2004). 10.1016/j.jqsrt.2003.08.007
-
(2004)
J. Quant. Spectrosc. Radiat. Transf.
, vol.86
, pp. 285
-
-
Nikolić, D.1
Djurović, S.2
Mijatović, Z.3
Kobilarov, R.4
Vujičić, B.5
Irišan, M.6
-
14
-
-
0036672677
-
-
0963-0252,. 10.1088/0963-0252/11/3A/314
-
S. Djurović, D. Nikolić, Z. Mijatović, R. Kobilarov, and N. Konjević, Plasma Sources Sci. Technol. 0963-0252 11, A95 (2002). 10.1088/0963-0252/11/3A/314
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 95
-
-
Djurović, S.1
Nikolić, D.2
Mijatović, Z.3
Kobilarov, R.4
Konjević, N.5
-
15
-
-
0037151357
-
-
0022-3727,. 10.1088/0022-3727/35/16/307
-
X. Duten, A. Rousseau, A. Gicquel, K. Hassouni, and P. Leprince, J. Phys. D: Appl. Phys. 0022-3727 35, 1939 (2002). 10.1088/0022-3727/35/16/307
-
(2002)
J. Phys. D: Appl. Phys.
, vol.35
, pp. 1939
-
-
Duten, X.1
Rousseau, A.2
Gicquel, A.3
Hassouni, K.4
Leprince, P.5
-
16
-
-
79956030874
-
-
0003-6951,. 10.1063/1.1497998
-
B. A. Cruden, M. V. V. S. Rao, S. P. Sharma, and M. Meyyappan, Appl. Phys. Lett. 0003-6951 81, 990 (2002). 10.1063/1.1497998
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 990
-
-
Cruden, B.A.1
Rao, M.V.V.S.2
Sharma, S.P.3
Meyyappan, M.4
-
17
-
-
34547372993
-
-
0022-3727,. 10.1088/0022-3727/40/14/015
-
Q. Wang, F. Doll, V. Donnelly, D. J. Economou, N. Sadeghi, and G. F. Franz, J. Phys. D: Appl. Phys. 0022-3727 40, 4202 (2007). 10.1088/0022-3727/40/ 14/015
-
(2007)
J. Phys. D: Appl. Phys.
, vol.40
, pp. 4202
-
-
Wang, Q.1
Doll, F.2
Donnelly, V.3
Economou, D.J.4
Sadeghi, N.5
Franz, G.F.6
-
18
-
-
0036862059
-
-
0963-0252,. 10.1088/0963-0252/11/4/314
-
C. Penache, M. Miclea, A. Bräuning-Demian, O. Hohn, S. Schössler, T. Jahnke, K. Niemax, and H. Schmidt-Böcking, Plasma Sources Sci. Technol. 0963-0252 11, 476 (2002). 10.1088/0963-0252/11/4/314
-
(2002)
Plasma Sources Sci. Technol.
, vol.11
, pp. 476
-
-
Penache, C.1
Miclea, M.2
Bräuning-Demian, A.3
Hohn, O.4
Schössler, S.5
Jahnke, T.6
Niemax, K.7
Schmidt-Böcking, H.8
|