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In our original procedure for the surface relief inscription on the LC polymer films, patterned irradiation with blue visible light (488 nm argon ion laser beam or 436 nm line from a Hg lamp) have been performed after preillumination with a 365 nm line from a Hg lamp over the polymer film area.13′14 Our recent investigations have revealed that the mass transfer also occurs via a simple one-step irradiation with 365 nm light through a photomask, provided that the trans-Az film is in the smectic LC state at controlled temperatures. This work adopts this patterned UV irradiation method
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13′14 Our recent investigations have revealed that the mass transfer also occurs via a simple one-step irradiation with 365 nm light through a photomask, provided that the trans-Az film is in the smectic LC state at controlled temperatures. This work adopts this patterned UV irradiation method.
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Our former investigation showed that when patterned irradiation with 436 nm light is performed after preirradiation with 365 nm light, the mass migration occurs from the illuminated areas to unilluminated ones see refs 13, 14, and 20, The migration direction in this study is seemingly opposite, i.e, the material migrates toward the illuminated areas. However, both processes have common features in that the migration occurs form the areas in the smectic LC state to those in the isotropic one
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Our former investigation showed that when patterned irradiation with 436 nm light is performed after preirradiation with 365 nm light, the mass migration occurs from the illuminated areas to unilluminated ones (see refs 13, 14, and 20). The migration direction in this study is seemingly opposite, i.e., the material migrates toward the illuminated areas. However, both processes have common features in that the migration occurs form the areas in the smectic LC state to those in the isotropic one.
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