Effects of the annealing duration of the ZnO buffer layer on structural and optical properties of ZnO rods grown by a hydrothermal process

Applied Surface Science

Volumn 255, Issue 20, 2009, Pages 8501-8505

  Shin, C M ^a   Lee, J Y ^a   Heo, J H ^a   Park, J H ^a   Kim, C R ^a   Ryu, H ^a   Chang, J H ^b   Son, C S ^c   Lee, W J ^d   Tan, S T ^e   Zhao, J L ^f   Sun, X W ^e,f  

^a Inje University   (South Korea)

^b Korea Maritime University   (South Korea)

^c Silla University   (South Korea)

^d Dong Eui University   (South Korea)

^e INSTITUTE OF MICROELECTRONICS   (Singapore)

^f NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Buffer layer annealing duration; Hydrothermal process; ZnO

Indexed keywords

ANNEALING; BUFFER LAYERS; CRYSTAL STRUCTURE; ENAMELS; FIELD EMISSION MICROSCOPES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTICAL PROPERTIES; ORGANIC CHEMICALS; ORGANOMETALLICS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); BUFFER LAYER ANNEALING; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; HYDROTHERMAL PROCESS; MORPHOLOGY AND CRYSTAL STRUCTURES; PHOTOLUMINESCENCE MEASUREMENTS; STRUCTURAL AND OPTICAL PROPERTIES; ZNO BUFFER LAYER;

II-VI SEMICONDUCTORS;

EID: 67650632766     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.06.004     Document Type: Article

References (39)

1. Hwang D.K., Kang S.H., Lim J.H., Yang E.J., Oh J.Y., Yang J.H., and Park S.J. Appl. Phys. Lett. 86 (2005) 222101-1-3
2. Zhong J., Chen H., Saraf G., Lu Y., Choi C.K., Song J.J., Mackie D.M., and Shen H. Appl. Phys. Lett. 90 (2007) 203515-1-3
3. Ryu Y., Lee T.S., Lubguban J.A., White H.W., Kim B.J., Park Y.S., and Youn C.J. Appl. Phys. Lett. 88 (2006) 241108-1-3
4. Leong E.S.P., Yu S.F., and Lau S.P. Appl. Phys. Lett. 89 (2006) 221109-1-3
5. Lu C.Y., Chang S.J., Chang S.P., Lee C.T., Kuo C.F., and Chang H.M. Appl. Phys. Lett. 89 (2006) 153101-1-3
6. Gao H., Fang G., Wang M., Liu N., Yuan L., Li C., Ai L., Zhang J., Zhou C., Wu S., and Zhao X. Mater. Res. Bull. 43 (2008) 3345-3351
7. Wang J.X., Sun X.W., Yang Y., Huang H., Lee Y.C., Tan O.K., and Vayssieres L. Nanotechnology 17 (2006) 4995-4998
8. Wang Z.L., and Song J. Science 312 (2006) 242-246
9. Lim D.G., Kim D.H., Kim J.K., Kwon O., Yang K.J., Park K.I., Kim B.S., Lee S.W., Park M.W., and Kwak D.J. Superlattices Microstruct. 39 (2006) 107-114
10. Kim C.R., Lee J.Y., Shin C.M., Leem J.Y., Ryu H., Chang J.H., Lee H.C., Son C.S., Lee W.J., Jung W.G., Tan S.T., Zhao J.L., and Sun X.W. Solid State Commun. 148 (2008) 395-398
11. Kiriakidis G., Suchea M., Christoulakis S., Horvath P., Kitsopoulos T., and Stoemenos J. Thin Solid Films 515 (2007) 8577-8581
12. Zhao Y., Jiang Y.J., and Fang Y. J. Cryst. Growth 307 (2007) 278-282
13. Kim D.C., Kong B.H., Jun S.O., Cho H.K., Park D.J., and Lee J.Y. Thin Solid Films 516 (2008) 5562-5566
14. Zhao X.Q., Kim C.R., Lee J.Y., Heo J.H., Shin C.M., Ryu H., Chang J.H., Lee H.C., Son C.S., Lee W.J., Jung W.G., Tan S.T., Zhao J.L., and Sun X.W. Appl. Surf. Sci. 255 (2009) 4461-4465
15. Zhao X.Q., Kim C.R., Lee J.Y., Shin C.M., Heo J.H., Leem J.Y., Ryu H., Chang J.H., Lee H.C., Son C.S., Shin B.C., Lee W.J., Jung W.G., Tan S.T., Zhao J.L., and Sun X.W. Appl. Surf. Sci. 255 (2009) 5861-5865
16. X.Q. Zhao, J.Y. Lee, C.R. Kim, J.H. Heo, C.M. Shin, J.Y. Leem, H.H. Ryu, J.H. Chang, H.C. Lee, W.G. Jung, C.S. Son, B.C. Shin, W.J. Lee, S.T. Tan, J. Zhao, X. Sun, Physica E, http://dx.doi.org/10.1016/j.physe.2009.04.012, in press.
17. Sahoo T., Tripathy S.K., Yu Y.T., Ahn H.K., Shin D.C., and Lee I.H. Mater. Res. Bull. 43 (2008) 2060-2068
18. Li S., Zhou S., Liu H., Hang Y., Xia C., Xu J., Gu S., and Zhang R. Mater. Lett. 61 (2007) 30-33
19. Ashfold M.N.R., Doherty R.P., Ndifor-Angwafor N.G., Riley D.J., and Sun Y. Thin Solid Films 515 (2007) 8679-8683
20. Guo M., Diao P., and Cai S. J. Solid State Chem. 178 (2005) 1864-1873
21. Wang Z., Huang B., Liu X., Qin X., Zhang X., Wei J., Wang P., Yao S., Zhang Q., and Jing X. Mater. Lett. 62 (2008) 2637-2639
22. Wang Z., Huang B., Qin X., Zhang X., Wang P., Wei J., Zhan J., Jing X., Liu H., Xu Z., Cheng H., Wang X., and Zheng Z. Mater. Lett. 63 (2009) 130-132
23. Wang J., Sallet V., Amiri G., Rommelluere J., Lusson A., Rzepka E., Lewis J.E., Galtier P., Fortunato E., Martins R., and Gorochov O. Phys. Status Solidi (c) 3 4 (2006) 1010-1013
24. Yang M., Yin G.F., Huang Z.B., Liao X.M., Kang Y.Q., and Yao Y.D. Appl. Surf. Sci. 254 (2008) 2917-2921
25. Kang J., Keem K., Jeong D., and Kim S. Jpn. J. Appl. Phys. 46 9B (2007) 6227-6229
26. Cheng J.P., Zhang X.B., and Luo Z.Q. Surf. Coat. Technol. 202 (2008) 4681-4686
27. Lim W.T., and Lee C.H. Thin Solid Films 353 (1999) 12-15
28. Zhu J., Lin B., Sun X., Yao R., Shi C., and Fu Z. Thin Solid Films 478 (2005) 218-222
29. Wang L., Pu Y., Chen Y.F., Mo C.L., Fang W.Q., Xiong C.B., Dai J.N., and Jiang F.Y. J. Cryst. Growth 284 (2005) 459-463
30. Kato H., Miyamoto K., Sano M., and Yao T. Appl. Phys. Lett. 84 (2004) 4562-4564
31. Lee S., Im Y.H., Kim S.H., and Hahn Y.B. Superlattices Microstruct. 39 (2006) 24-32
32. Sun X.W., Zhao J.L., Tan S.T., Tan L.H., Tung C.H., Lo G.Q., Kwong D.L., Zhang Y.W., Li X.M., and Teo K.L. Appl. Phys. Lett. 92 (2008) 111113-1-3
33. Pacholski C., Kornowski A., and Weller H. Angew. Chem. Int. Ed. 41 7 (2002) 1188-1191
34. Çetinörgü E., Goldsmith S., and Boxman R.L. Surf. Coat. Technol. 201 (2007) 7266-7272
35. Hirano S., Takeuchi N., Shimada S., Masuya K., Ibe K., Tsunakawa H., and Kuwabara M. J. Appl. Phys. 98 (2005) 094305-1-7
36. Yang J., Lang J., Yang L., Zhang Y., Wang D., Fan H., Liu H., Wang Y., and Gao M. J. Alloys Compd. 450 (2008) 521-524
37. Yang M., Yin G., Huang Z., Liao X., Kang Y., and Yao Y. Appl. Surf. Sci. 254 (2008) 2917-2921
38. Wang J., Sallet V., Amiri G., Rommelluere J.F., Lusson A., Lewis J.E., Galtier P., Fortunato E., Martins R., and Gorochov O. Thin Solid Films 515 (2006) 1527-1531
39. Wang L., Pu Y., Fang W., Dai J., Zheng C., Mo C., Xiong C., and Jiang F. Thin Solid Films 491 (2005) 323-327