Copper filling of 100 nm trenches using PEG, PPG, and a triblock copolymer as plating suppressors

Journal of the Electrochemical Society

Volumn 156, Issue 8, 2009, Pages

  Gallaway, Joshua W ^a,c   Willey, Mark J ^b   West, Alan C ^a  

^a Columbia University ^*  (United States)

^b Novellus Systems Inc   (United States)

^c City University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION TIME; BIS(3-SULFOPROPYL)DISULFIDE; COPPER PLATING BATHS; FILLING RATE; POLYPROPYLENE GLYCOL; SIMPLE EXPRESSION; STRONG CORRELATION; TIME-SCALE; TRIBLOCK COPOLYMERS;

ADSORPTION; ASPECT RATIO; COPOLYMERIZATION; COPPER OXIDES; ELECTROPLATING; ETHYLENE; ETHYLENE GLYCOL; FILLING; PHOTOLITHOGRAPHY; POLYETHYLENE OXIDES; POLYPROPYLENE OXIDES; PROPYLENE;

POLYETHYLENE GLYCOLS;

EID: 67650609767     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3142422     Document Type: Article

References (37)

1. P. M. Vereecken, R. A. Binstead, H. Deligianni, and P. C. Andricacos, IBM J. Res. Dev. 0018-8646, 49, 3 (2005).
2. P. C. Andricacos, C. Uzoh, J. O. Dukovic, J. Horkans, and H. Deligianni, IBM J. Res. Dev. 0018-8646, 42, 567 (1998).
3. M. Yokoi, S. Konishi, and T. Hayashi, Denki Kagaku oyobi Kogyo Butsuri Kagaku 0366-9297, 52, 218 (1984).
4. J. P. Healy, D. Pletcher, and M. Goodenough, J. Electroanal. Chem. 0022-0728, 338, 155 (1992). 10.1016/0022-0728(92)80420-9
5. J. J. Kelly and A. C. West, J. Electrochem. Soc. 0013-4651, 145, 3472 (1998). 10.1149/1.1838829
6. K. R. Hebert, S. Adhikari, and J. E. Houser, J. Electrochem. Soc. 0013-4651, 152, C324 (2005). 10.1149/1.1882112
7. M. L. Walker, L. J. Richter, and T. P. Moffat, J. Electrochem. Soc. 0013-4651, 152, C403 (2005). 10.1149/1.1915271
8. J. G. Long, P. C. Searson, and P. M. Vereecken, J. Electrochem. Soc. 0013-4651, 153, C258 (2006). 10.1149/1.2168050
9. Y. Jin, K. Kondo, Y. Suzuki, T. Matsumoto, and D. P. Barkey, Electrochem. Solid-State Lett. 1099-0062, 8, C6 (2005). 10.1149/1.1830371
10. K. R. Hebert, J. Electrochem. Soc. 0013-4651, 148, C726 (2001). 10.1149/1.1408634
11. M. J. Willey and A. C. West, J. Electrochem. Soc. 0013-4651, 154, D156 (2007). 10.1149/1.2431320
12. K. Kondo, N. Yamakawa, Z. Tanaka, and K. Hayashi, J. Electroanal. Chem. 0022-0728, 559, 137 (2003). 10.1016/S0022-0728(03)00110-4
13. T. P. Moffat, D. Wheeler, and D. Josell, J. Electrochem. Soc. 0013-4651, 151, C262 (2004). 10.1149/1.1651530
14. M. Tan and J. N. Harb, J. Electrochem. Soc. 0013-4651, 150, C420 (2003). 10.1149/1.1570412
15. Y. Cao, P. Taephaisitphongse, R. Chalupa, and A. C. West, J. Electrochem. Soc. 0013-4651, 148, C466 (2001). 10.1149/1.1377898
16. A. C. West, J. Electrochem. Soc. 0013-4651, 147, 227 (2000). 10.1149/1.1393179
17. P. Taephaisitphongse, Y. Cao, and A. C. West, J. Electrochem. Soc. 0013-4651, 148, C492 (2001). 10.1149/1.1376636
18. T. P. Moffat, J. E. Bonevich, W. H. Huber, A. Stanishevsky, D. R. Kelly, G. R. Stafford, and D. Josell, J. Electrochem. Soc. 0013-4651, 147, 4524 (2000). 10.1149/1.1394096
19. M. J. Willey, J. Reid, and A. C. West, Electrochem. Solid-State Lett. 1099-0062, 10, D38 (2007). 10.1149/1.2436653
20. T. P. Moffat, D. Wheeler, S. K. Kim, and D. Josell, J. Electrochem. Soc. 0013-4651, 153, C127 (2006). 10.1149/1.2165580
21. T. P. Moffat, D. Wheeler, W. H. Huber, and D. Josell, Electrochem. Solid-State Lett. 1099-0062, 4, C26 (2001). 10.1149/1.1354496
22. A. C. West, S. Mayer, and J. Reid, Electrochem. Solid-State Lett. 1099-0062, 4, C50 (2001). 10.1149/1.1375856
23. T. P. Moffat, D. Wheeler, M. D. Edelstein, and D. Josell, IBM J. Res. Dev. 0018-8646, 49, 19 (2005).
24. D. Wheeler, D. Josell, and T. P. Moffat, J. Electrochem. Soc. 0013-4651, 150, C302 (2003). 10.1149/1.1562598
25. D. Josell, D. Wheeler, W. H. Huber, J. E. Bonevich, and T. P. Moffat, J. Electrochem. Soc. 0013-4651, 148, C767 (2001). 10.1149/1.1414287
26. R. Akolkar and U. Landau, J. Electrochem. Soc. 0013-4651, 151, C702 (2004). 10.1149/1.1799431
27. E. Rusli, F. Xue, T. O. Drews, P. M. Vereecken, P. Andricacos, H. Deligianni, R. D. Braatz, and R. C. Alkire, J. Electrochem. Soc. 0013-4651, 154, D584 (2007). 10.1149/1.2772425
28. Y. Qin, X. H. Li, F. Xue, P. M. Vereecken, P. Andricacos, H. Deligianni, R. D. Braatz, and R. C. Alkire, J. Electrochem. Soc. 0013-4651, 155, D223 (2008). 10.1149/1.2816282
29. X. H. Li, T. O. Drews, E. Rusli, F. Xue, Y. He, R. Braatz, and R. Alkire, J. Electrochem. Soc. 0013-4651, 154, D230 (2007). 10.1149/1.2434686
30. W. P. Dow and M. Y. Yen, Electrochem. Solid-State Lett. 1099-0062, 8, C161 (2005). 10.1149/1.2039957
31. W. P. Dow, M. Y. Yen, W. B. Lin, and S. W. Ho, J. Electrochem. Soc. 0013-4651, 152, C769 (2005). 10.1149/1.2052019
32. J. W. Gallaway, M. J. Willey, and A. C. West, J. Electrochem. Soc. 0013-4651, 156, D146 (2009). 10.1149/1.3078405
33. J. W. Gallaway and A. C. West, J. Electrochem. Soc. 0013-4651, 155, D632 (2008). 10.1149/1.2958309
34. M. J. Willey and A. C. West, Electrochem. Solid-State Lett. 1099-0062, 9, E17 (2006). 10.1149/1.2201253
35. Q. Huang, B. C. Baker-O'Neil, J. J. Kelly, P. Broekmann, A. Wirth, C. Emnet, M. Martin, M. Hahn, A. Wagner, and D. Mayer, Electrochem. Solid-State Lett. 1099-0062, 12, D27 (2009). 10.1149/1.3078074
36. R. Akolkar, C. Cheng, R. Chebiam, A. Fajardo, and V. Dubin, ECS Trans. 1938-5862, 2 (6), 13 (2007). 10.1149/1.2408859
37. J. J. Kelly and A. C. West, J. Electrochem. Soc. 0013-4651, 145, 3477 (1998). 10.1149/1.1838830