Microstructures and thermoelectric properties of an annealed Ti 0.5(Hf 0.5Zr 0.5) 0.5NiSn 0.998Sb 0.002 Ribbon

Journal of Electronic Materials

Volumn 38, Issue 7, 2009, Pages 1154-1158

  Morimura, Takao ^a   Hasaka, Masayuki ^a   Yoshida, Syotaro ^a   Nakashima, Hiromichi ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Dimensionless figure of merit; Harman method; Rietveld refinement; Seebeck coefficient; Spin cast liquid quenching; Transmission electron microscopy; X ray diffraction

Indexed keywords

ANNEALING TIME; ATOMIC ORDERING; DIMENSIONLESS FIGURE OF MERIT; ELECTRICAL CONDUCTIVITY; HALF-HEUSLER; HALF-HEUSLER COMPOUND; HARMAN METHOD; HETEROGENEOUS MICROSTRUCTURE; MICROSCOPIC ANALYSIS; POWDER X RAY DIFFRACTION; ROOM TEMPERATURE; SPIN-CAST LIQUID QUENCHING; THERMOELECTRIC PROPERTIES; TRANSMISSION ELECTRON;

DIFFRACTION; ELECTRIC CONDUCTIVITY; ELECTRON MICROSCOPES; HAFNIUM; LIQUIDS; MICROSTRUCTURE; QUENCHING; RIETVELD METHOD; RIETVELD REFINEMENT; SEEBECK COEFFICIENT; SPIN DYNAMICS; THERMOELECTRIC EQUIPMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; ZIRCONIUM;

ANNEALING;

EID: 67650424256     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-009-0773-8     Document Type: Conference Paper

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